Dielectric relaxation and steady-state leakage in low-temperature sputtered (Ba, Sr)TiO3 thin films

被引:11
作者
Werner, MC
Banerjee, I
Zhang, R
McIntyre, PC
Tani, N
Tanimura, M
机构
[1] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[2] Intel Corp, Santa Clara, CA 95052 USA
[3] ULVAC Japan Ltd, Susono, Shizuoka, Japan
关键词
D O I
10.1063/1.1325378
中图分类号
O59 [应用物理学];
学科分类号
摘要
Dielectric relaxation and steady-state leakage currents were studied over a range of bias voltages for Pt-electroded capacitors in which the 50-nm-thick (Ba, Sr)TiO3 dielectric layer was sputter deposited at 480 degreesC. A pronounced polarity dependence in the current-voltage characteristic of the capacitors was observed. Dielectric relaxation in the films showed a Curie-von Schweidler time dependence (J = J(0)t(-n)) for intervals of 3-200 s duration after application of a voltage step. The relaxation current density was found to depend linearly on electric field for fields up to 700 kV/cm and nonlinearly at higher fields. In addition to the Curie-von Schweidler relaxation currents, a time-dependent leakage current was detected under high voltage bias conditions. An empirical model developed to describe leakage currents in these films is presented. (C) 2001 American Institute of Physics.
引用
收藏
页码:2309 / 2313
页数:5
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