The influence of surface roughness on the angular dependence of the sputter yield

被引：107

作者：

Kustner, M ^{[1
]}

Eckstein, W ^{[1
]}

Dose, V ^{[1
]}

Roth, J ^{[1
]}

机构：

[1] Max Planck Inst Plasma Phys, EURATOM Assoc, Abt OP, D-85748 Garching, Germany

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1998年 / 145卷 / 03期

关键词：

D O I：

10.1016/S0168-583X(98)00399-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A new approach to study the influence of target surface roughness on sputter yields is explored. The method is based on the experimental determination of the surface topography and the subsequent evaluation of a distribution of local angles of incidence for the incident ions. This distribution is used as input to the Monte Carlo program TRIM.SP for the calculation of the sputter yield of the target with the rough surface. Additionally, the redeposition of sputtered target atoms on the rough surface is calculated. The resulting net sputter yields determined with this procedure are in satisfactory agreement with experimental data. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：320 / 331

页数：12

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