Non-contact scanning nonlinear dielectric microscopy

被引:35
作者
Ohara, K [1 ]
Cho, Y [1 ]
机构
[1] Tohoku Univ, Res Inst Elect Commun, Aoba Ku, Sendai, Miyagi, Japan
关键词
D O I
10.1088/0957-4484/16/3/010
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Contact-type scanning nonlinear dielectric microscopy (SNDM) can measure the distribution of linear and nonlinear dielectric properties of insulators with sub-nanometre resolution. SNDM, however, has a tip-abrasion problem, and this problem is one of the obstacles in obtaining a high-quality image. In this paper, in order to improve SNDM, we propose a non-contact scanning nonlinear dielectric microscopy (NC-SNDM) which focuses on the nonlinear dielectric signal for controlling the non-contact condition. With the NC-SNDM technique, topographic and SNDM images were obtained successfully. Moreover, from the calculation results, it was confirmed that NC-SNDM has atomic-order sensitivity to the gap between the tip and the specimen.
引用
收藏
页码:S54 / S58
页数:5
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