Uncertainty in pitch measurements of one-dimensional grating standards using a nanometrological atomic force microscope

Precision measurements of 240 nm-pitch one-dimensional grating standards were carried out using an atomic force microscope (AFM) with a high-resolution three-axis laser interferometer (nanometrological AFM). Laser sources of the three-axis laser interferometer in the nanometrological AFM were calibrated with an I-2-stabilized He-Ne laser at a wavelength of 633 nm. The results of the precision measurements using the nanometrological AFM have direct traceability to the length standard. The uncertainty in the pitch measurements was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement. The primary source of uncertainty in the measurements was derived from interferometer nonlinearity, and its value was approximately 0.115 nm. Expanded uncertainty (k = 2) of less than 0.31 nm was obtained. It is suggested that the nanometrological AFM is a useful instrument for the nanometrological standard calibration.