Accurate topographic images using a measuring atomic force microscope

被引:27
作者
Gonda, S
Doi, T
Kurosawa, T
Tanimura, Y
Hisata, N
Yamagishi, T
Fujimoto, H
Yukawa, H
机构
[1] Natl Res Lab Metrol, Mech Metrol Dept, Tsukuba, Ibaraki 3058563, Japan
[2] Olympus Opt, Prod Dev Dept, Tokyo 1928507, Japan
关键词
AFM (atomic force microscope); nanometrology; interferometry; calibration;
D O I
10.1016/S0169-4332(98)00851-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A real-time measuring atomic force microscope (AFM) equipped with a high-resolution three-axis laser interferometer has been constructed. A three-sided mirror as a sample holder is placed on a three-dimensional (3D) scanner which was designed for axis-independent scanning. The mirror is scanned so that the cantilever traces the surface form. The traces of the mirror are monitored along the X/Y/Z-axis independently and simultaneously by the laser interferometers and fed back to the X-Y servo-scan and Z-height control. Each interferometer unit has a four-pass optical arrangement and homodyne detection system. After the digital signal processing of the four-phase output (phase-shifted by 90 degrees) from the detectors, the signal is introduced into a fringe counter, which has an electrical phase resolution of 2048. A final system resolution of 0.04 nm (lambda/16 384) has been realized. Topographic images of a standard sample of a precisely etched grid pattern (pitch and height) were taken with an without interferometric calibration. Piezo distortions along the X-Y plane caused by hysteresis or creep were almost eliminated. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:505 / 509
页数:5
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