Scanning tunneling microscopy and spectroscopy of gallium oxide deposition and oxidation on GaAs(001)-c(2x8)/(2x4)

被引:139
作者
Hale, MJ [1 ]
Yi, SI
Sexton, JZ
Kummel, AC
Passlack, M
机构
[1] Univ Calif San Diego, Dept Chem, La Jolla, CA 92093 USA
[2] Motorola Inc, Semicond Prod Sector, Tempe, AZ 85284 USA
关键词
D O I
10.1063/1.1601596
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The surface structures formed upon deposition of O-2 and Ga2O onto the technologically important arsenic-rich GaAs(001)-c(2x8)/(2x4) surface have been studied using scanning tunneling microscopy and spectroscopy, and the results are compared to density functional theory calculations. O-2 chemisorbs by displacing first layer arsenic atoms bonded to second layer gallium atoms. Oxygen chemisorption pins the Fermi level at less than 5% monolayer coverage by creating a donor and acceptor site within the band gap originating from the gallium atom bonded between the two O atoms. In contrast, Ga2O chemisorbs by inserting into arsenic dimer pairs at elevated surface temperatures. A monolayer of Ga2O forms a (2x2) surface structure with a crystalline interface that is electronically unpinned: there are no states within the band gap. The unpinned interface results from Ga2O restoring the surface arsenic and gallium atoms to near-bulk charge. (C) 2003 American Institute of Physics.
引用
收藏
页码:6719 / 6728
页数:10
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