Measurement of surface roughness by atomic force microscopy and Rutherford backscattering spectrometry of CdS nanocrystalline films

被引：28

作者：

Nanda, KK ^{[1
]}

Sarangi, SN ^{[1
]}

Sahu, SN ^{[1
]}

机构：

[1] Inst Phys, Bhubaneswar 751005, Orissa, India

来源：

APPLIED SURFACE SCIENCE | 1998年 / 133卷 / 04期

关键词：

CdS; roughness; atomic force microscopy; Rutherford backscattering spectrometry;

D O I：

10.1016/S0169-4332(98)00212-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Surface roughness of chemically prepared CdS samples of different thicknesses were studied by atomic force microscopy and Rutherford backscattering spectrometry. Both the studies qualitatively gave the same roughness and were found to increase with increasing thickness. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：293 / 297

页数：5

共 7 条

[1]

Feldman L. C., 1986, Fundamentals of Surface and Thin Film Analysis

[2] STABLE GROWTH AND KINETIC ROUGHENING IN ELECTROCHEMICAL DEPOSITION [J].