The characteristics of organic light emitting diodes with Al doped zinc oxide grown by atomic layer deposition as a transparent conductive anode

被引:30
作者
Gong, Su Cheol [1 ]
Jang, Ji Geun [1 ]
Chang, Ho Jung [1 ]
Park, Jin-Seong [2 ]
机构
[1] Dankook Univ, Dept Elect Engn, Cheonan 330714, Chungnam, South Korea
[2] Dankook Univ, Dept Mat Sci & Engn, Cheonan 330714, Chungnam, South Korea
关键词
Al doped ZnO (AZO); Transparent conductive oxide (TCO); Organic light emitting diodes (OLEDs); Atomic layer deposition (ALD); THIN-FILMS; ZNO FILMS; ELECTRODE;
D O I
10.1016/j.synthmet.2011.02.007
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Al doped zinc oxide (AZO) films, deposited by atomic layer deposition (ALD) were investigated for applying a transparent conductive oxide (TCO) layer as an anode for organic light emitting diode (OLED) devices. AZO films with a thickness of 100 nm were deposited at various Al atomic ratios ranging from 0 to 5% at a deposition temperature (250 degrees C). The optimum electrical properties: the carrier mobility, the resistivity, and the sheet resistance for the 2% AZO film were found to be 16.2 cm(2) V-1 s(-1), 1.5 x 10(-3) cm(-3), and 217 Omega/sq. respectively. The red OLED devices were fabricated using AZO anodes utilizing the various Al atomic ratios; the electrical and optical characteristics were then investigated. The best luminance, quantum efficiency, and current efficiency were found in the OLED device using the 2% AZO TCO; the results were 16599 cd/m(2), 8.2%, and 7.5 cd/A, respectively. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:823 / 827
页数:5
相关论文
共 29 条
[1]   Material design of hole transport materials capable of thick-film formation in organic light emitting diodes [J].
Aonuma, Masaki ;
Oyamada, Takahito ;
Sasabe, Hiroyuki ;
Miki, Tetsuzou ;
Adachi, Chihaya .
APPLIED PHYSICS LETTERS, 2007, 90 (18)
[2]   Characteristics of Al doped ZnO co-sputtered InZnO anode films prepared by direct current magnetron sputtering for organic light-emitting diodes [J].
Bae, Jung-Hyeok ;
Kim, Han-Ki .
THIN SOLID FILMS, 2008, 516 (21) :7866-7870
[3]   Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films [J].
Banerjee, Parag ;
Lee, Won-Jae ;
Bae, Ki-Ryeol ;
Lee, Sang Bok ;
Rubloff, Gary W. .
JOURNAL OF APPLIED PHYSICS, 2010, 108 (04)
[4]   Characteristics of Ni-doped IZO layers grown on IZO anode for enhancing hole injection in OLEDs [J].
Choi, Kwang-Hyuk ;
Jeong, Jin-A ;
Kim, Han-Ki ;
Lee, Jae-Young ;
Lee, Jung-Hwan ;
Bae, Hyo-Dae ;
Tak, Yoon-Heong ;
Lee, Se-Hyung ;
Leem, Dong-Seok ;
Kim, Jang-Joo .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (11) :J340-J344
[5]   The low temperature synthesis of Al doped ZnO films on glass and polymer using pulsed co-magnetron sputtering: H2 effect [J].
Chung, Yun M. ;
Moon, Chang S. ;
Jung, Woo S. ;
Han, Jeon G. .
THIN SOLID FILMS, 2006, 515 (02) :567-570
[6]   Atomic Layer Deposition of Al-doped ZnO Films: Effect of Grain Orientation on Conductivity [J].
Dasgupta, Neil P. ;
Neubert, Sebastian ;
Lee, Wonyoung ;
Trejo, Orlando ;
Lee, Jung-Rok ;
Prinz, Fritz B. .
CHEMISTRY OF MATERIALS, 2010, 22 (16) :4769-4775
[7]   Modification of the Surface Properties of Indium Tin Oxide with Benzylphosphonic Acids: A Joint Experimental and Theoretical Study [J].
Hotchkiss, Peter J. ;
Li, Hong ;
Paramonov, Pavel B. ;
Paniagua, Sergio A. ;
Jones, Simon C. ;
Armstrong, Neal R. ;
Bredas, Jean-Luc ;
Marder, Seth R. .
ADVANCED MATERIALS, 2009, 21 (44) :4496-+
[8]  
HWANG ST, 2001, T ELECT ELECT MAT, V11, P81
[9]   Aluminum-doped zinc oxide films as transparent conductive electrode for organic light-emitting devices [J].
Jiang, X ;
Wong, FL ;
Fung, MK ;
Lee, ST .
APPLIED PHYSICS LETTERS, 2003, 83 (09) :1875-1877
[10]   Red phosphorescent organic light-emitting diodes with indium tin oxide/single organic layer/Al simple device structure [J].
Joo, Chul Woong ;
Jeon, Soon Ok ;
Yook, Kyoung Soo ;
Lee, Jun Yeob .
ORGANIC ELECTRONICS, 2010, 11 (01) :36-40