共 21 条
Rapid directed self assembly of lamellar microdomains from a block copolymer containing hybrid
被引:28
作者:

Cheng, Joy Y.
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

Pitera, Jed
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

Park, Oun-Ho
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

Flickner, Myron
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

Ruiz, Ricardo
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

Black, Charles T.
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

Kim, Ho-Cheol
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机构: IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
机构:
[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
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D O I:
10.1063/1.2791003
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The directed self-assembly of a lamellar-forming hybrid block copolymer system comprising of a poly(styrene-b-ethylene oxide) and organosilicates (OSs) has been investigated. The addition of OS to the block copolymer is found to provide additional control over the persistence length of lamellae as well as the behavior of directed self assembly. Two OSs with different molecular weights and reactivities have been compared in this experiment. Both OSs yield the same local structure of lamellar domains but different degrees of mid- and long-range order. Longer correlation length and better alignment of lamellar domains were observed with the lower molecular weight, more reactive OS, which suggest a potential guidance for controlling over microdomains in block copolymer-containing hybrid systems. (c) 2007 American Institute of Physics.
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共 21 条
[1]
BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT
[J].
BATES, FS
;
FREDRICKSON, GH
.
ANNUAL REVIEW OF PHYSICAL CHEMISTRY,
1990, 41 (01)
:525-557

BATES, FS
论文数: 0 引用数: 0
h-index: 0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974 AT&T BELL LABS,MURRAY HILL,NJ 07974

FREDRICKSON, GH
论文数: 0 引用数: 0
h-index: 0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974 AT&T BELL LABS,MURRAY HILL,NJ 07974
[2]
Polymer self assembly in semiconductor microelectronics
[J].
Black, C. T.
;
Ruiz, R.
;
Breyta, G.
;
Cheng, J. Y.
;
Colburn, M. E.
;
Guarini, K. W.
;
Kim, H.-C.
;
Zhang, Y.
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
2007, 51 (05)
:605-633

Black, C. T.
论文数: 0 引用数: 0
h-index: 0
机构:
Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Ruiz, R.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Breyta, G.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Cheng, J. Y.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Colburn, M. E.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Guarini, K. W.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Kim, H.-C.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

Zhang, Y.
论文数: 0 引用数: 0
h-index: 0
机构: Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[3]
Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly
[J].
Black, CT
;
Bezencenet, O
.
IEEE TRANSACTIONS ON NANOTECHNOLOGY,
2004, 3 (03)
:412-415

Black, CT
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

Bezencenet, O
论文数: 0 引用数: 0
h-index: 0
机构: IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
[4]
Templated self-assembly of block copolymers: Top-down helps bottom-up
[J].
Cheng, Joy Y.
;
Ross, Caroline A.
;
Smith, Henry I.
;
Thomas, Edwin L.
.
ADVANCED MATERIALS,
2006, 18 (19)
:2505-2521

Cheng, Joy Y.
论文数: 0 引用数: 0
h-index: 0
机构: MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

Ross, Caroline A.
论文数: 0 引用数: 0
h-index: 0
机构: MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

Smith, Henry I.
论文数: 0 引用数: 0
h-index: 0
机构: MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

Thomas, Edwin L.
论文数: 0 引用数: 0
h-index: 0
机构: MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[5]
Nanostructure engineering by templated self-assembly of block copolymers
[J].
Cheng, JY
;
Mayes, AM
;
Ross, CA
.
NATURE MATERIALS,
2004, 3 (11)
:823-828

Cheng, JY
论文数: 0 引用数: 0
h-index: 0
机构:
MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

Mayes, AM
论文数: 0 引用数: 0
h-index: 0
机构:
MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

Ross, CA
论文数: 0 引用数: 0
h-index: 0
机构:
MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[6]
Large-scale alignment of ABC block copolymer microdomains via solvent vapor treatment
[J].
Fukunaga, K
;
Elbs, H
;
Magerle, R
;
Krausch, G
.
MACROMOLECULES,
2000, 33 (03)
:947-953

Fukunaga, K
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany

Elbs, H
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany

Magerle, R
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany

Krausch, G
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany Univ Bayreuth, Lehrstuhl Phys Chem 2, D-95440 Bayreuth, Germany
[7]
Block copolymer lithography: Merging "bottom-up" with "top-down" processes
[J].
Hawker, CJ
;
Russell, TP
.
MRS BULLETIN,
2005, 30 (12)
:952-966

Hawker, CJ
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA

论文数: 引用数:
h-index:
机构:
[8]
Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer
[J].
Jung, Yeon Sik
;
Ross, C. A.
.
NANO LETTERS,
2007, 7 (07)
:2046-2050

Jung, Yeon Sik
论文数: 0 引用数: 0
h-index: 0
机构:
MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

Ross, C. A.
论文数: 0 引用数: 0
h-index: 0
机构:
MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[9]
Patternable block copolymers
[J].
Li, MQ
;
Coenjarts, CA
;
Ober, CK
.
BLOCK COPOLYMERS II,
2005, 190
:183-226

Li, MQ
论文数: 0 引用数: 0
h-index: 0
机构:
Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

Coenjarts, CA
论文数: 0 引用数: 0
h-index: 0
机构:
Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

Ober, CK
论文数: 0 引用数: 0
h-index: 0
机构:
Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA
[10]
2.5-inch disk patterned media prepared by an artificially assisted self-assembling method
[J].
Naito, K
;
Hieda, H
;
Sakurai, M
;
Kamata, Y
;
Asakawa, K
.
IEEE TRANSACTIONS ON MAGNETICS,
2002, 38 (05)
:1949-1951

Naito, K
论文数: 0 引用数: 0
h-index: 0
机构:
Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan

Hieda, H
论文数: 0 引用数: 0
h-index: 0
机构: Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan

Sakurai, M
论文数: 0 引用数: 0
h-index: 0
机构: Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan

Kamata, Y
论文数: 0 引用数: 0
h-index: 0
机构: Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan

Asakawa, K
论文数: 0 引用数: 0
h-index: 0
机构: Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan