Rapid directed self assembly of lamellar microdomains from a block copolymer containing hybrid

被引:28
作者
Cheng, Joy Y.
Pitera, Jed
Park, Oun-Ho
Flickner, Myron
Ruiz, Ricardo
Black, Charles T.
Kim, Ho-Cheol
机构
[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1063/1.2791003
中图分类号
O59 [应用物理学];
学科分类号
摘要
The directed self-assembly of a lamellar-forming hybrid block copolymer system comprising of a poly(styrene-b-ethylene oxide) and organosilicates (OSs) has been investigated. The addition of OS to the block copolymer is found to provide additional control over the persistence length of lamellae as well as the behavior of directed self assembly. Two OSs with different molecular weights and reactivities have been compared in this experiment. Both OSs yield the same local structure of lamellar domains but different degrees of mid- and long-range order. Longer correlation length and better alignment of lamellar domains were observed with the lower molecular weight, more reactive OS, which suggest a potential guidance for controlling over microdomains in block copolymer-containing hybrid systems. (c) 2007 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 21 条
[1]   BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT [J].
BATES, FS ;
FREDRICKSON, GH .
ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) :525-557
[2]   Polymer self assembly in semiconductor microelectronics [J].
Black, C. T. ;
Ruiz, R. ;
Breyta, G. ;
Cheng, J. Y. ;
Colburn, M. E. ;
Guarini, K. W. ;
Kim, H.-C. ;
Zhang, Y. .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2007, 51 (05) :605-633
[3]   Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly [J].
Black, CT ;
Bezencenet, O .
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2004, 3 (03) :412-415
[4]   Templated self-assembly of block copolymers: Top-down helps bottom-up [J].
Cheng, Joy Y. ;
Ross, Caroline A. ;
Smith, Henry I. ;
Thomas, Edwin L. .
ADVANCED MATERIALS, 2006, 18 (19) :2505-2521
[5]   Nanostructure engineering by templated self-assembly of block copolymers [J].
Cheng, JY ;
Mayes, AM ;
Ross, CA .
NATURE MATERIALS, 2004, 3 (11) :823-828
[6]   Large-scale alignment of ABC block copolymer microdomains via solvent vapor treatment [J].
Fukunaga, K ;
Elbs, H ;
Magerle, R ;
Krausch, G .
MACROMOLECULES, 2000, 33 (03) :947-953
[7]   Block copolymer lithography: Merging "bottom-up" with "top-down" processes [J].
Hawker, CJ ;
Russell, TP .
MRS BULLETIN, 2005, 30 (12) :952-966
[8]   Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer [J].
Jung, Yeon Sik ;
Ross, C. A. .
NANO LETTERS, 2007, 7 (07) :2046-2050
[9]   Patternable block copolymers [J].
Li, MQ ;
Coenjarts, CA ;
Ober, CK .
BLOCK COPOLYMERS II, 2005, 190 :183-226
[10]   2.5-inch disk patterned media prepared by an artificially assisted self-assembling method [J].
Naito, K ;
Hieda, H ;
Sakurai, M ;
Kamata, Y ;
Asakawa, K .
IEEE TRANSACTIONS ON MAGNETICS, 2002, 38 (05) :1949-1951