Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

被引：28

作者：

Li, XF ^{[1
]}

Miao, WN ^{[1
]}

Zhang, Q ^{[1
]}

Huang, L ^{[1
]}

Zhang, ZJ ^{[1
]}

Hua, ZY ^{[1
]}

机构：

[1] Fudan Univ, Dept Mat Sci, Shanghai 200433, Peoples R China

来源：

JOURNAL OF MATERIALS RESEARCH | 2005年 / 20卷 / 06期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1557/JMR.2005.0184

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High-mobility molybdenum-doped In2O3 films (IMO) were prepared on the normal glass substrate by reactive direct current magnetron sputtering from the molybdenum-embedded indium metal target. The effects of oxygen partial pressure, substrate temperature, and sputtering current on the optoelectrical properties of IMO films were investigated. The films with the highest carrier mobility of 50 cm(2) V-1 s(-1), as well as the average visible transmission greater than 80% including the 1.2-mm-thick glass substrate, were obtained. The minimum resistivity of the films is 3.7 x 10(-4) ohm cm. The properties of the IMO films are sensitive to the oxygen partial pressure in the sputtering environment. X-ray diffraction measurements indicate that the films show In2O3 crystal structure.

引用

页码：1404 / 1408

页数：5

共 21 条

[1] INTRINSIC PERFORMANCE LIMITS IN TRANSPARENT CONDUCTING OXIDES [J].

BELLINGHAM, JR ;

PHILLIPS, WA ;

ADKINS, CJ .

JOURNAL OF MATERIALS SCIENCE LETTERS, 1992, 11 (05) :263-265

[2] Intrinsic limit of electrical properties of transparent conductive oxide films [J].

Chen, M ;

Pei, ZL ;

Wang, X ;

Yu, YH ;

Liu, XH ;

Sun, C ;

Wen, LS .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (20) :2538-2548

[3] Characterization of transparent conducting oxides [J].

Coutts, TJ ;

Young, DL ;

Li, XN .

MRS BULLETIN, 2000, 25 (08) :58-65

[4] Non-vacuum and PLD growth of next generation TCO materials [J].

Ginley, D ;

Roy, B ;

Ode, A ;

Warmsingh, C ;

Yoshida, Y ;

Parilla, P ;

Teplin, C ;

Kaydanova, T ;

Miedaner, A ;

Curtis, C ;

Martinson, A ;

Coutts, T ;

Readey, D ;

Hosono, H ;

Perkins, J .

THIN SOLID FILMS, 2003, 445 (02) :193-198

[5] Transparent conducting oxides [J].

Ginley, DS ;

Bright, C .

MRS BULLETIN, 2000, 25 (08) :15-18

[6] Criteria for choosing transparent conductors [J].

Gordon, RG .

MRS BULLETIN, 2000, 25 (08) :52-57

[7] Transparent and conducting ITO films:: new developments and applications [J].

Granqvist, CG ;

Hultåker, A .

THIN SOLID FILMS, 2002, 411 (01) :1-5

[8] EVAPORATED SN-DOPED IN2O3 FILMS - BASIC OPTICAL-PROPERTIES AND APPLICATIONS TO ENERGY-EFFICIENT WINDOWS [J].

HAMBERG, I ;

GRANQVIST, CG .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (11) :R123-R159

[9] Dependence of the sheet resistance of indium-tin-oxide thin films on grain size and grain orientation determined from X-ray diffraction techniques [J].

Kulkarni, AK ;

Schulz, KH ;

Lim, TS ;

Khan, M .

THIN SOLID FILMS, 1999, 345 (02) :273-277

[10] Molybdenum-doped indium oxide transparent conductive thin films [J].

Meng, Y ;

Yang, XL ;

Chen, HX ;

Shen, J ;

Jiang, YM ;

Zhang, ZJ ;

Hua, ZY .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (01) :288-290

← 1 2 3 →