Annealing studies of TiN films deposited by plasma-assisted CVD

被引：19

作者：

Cheng, Z ^{[1
]}

Peng, HR ^{[1
]}

Xie, GW ^{[1
]}

Shi, YL ^{[1
]}

机构：

[1] Qingdao Inst Chem Technol, Thin Films Lab, Qingdao 266042, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2001年 / 138卷 / 2-3期

关键词：

plasma-assisted CVD; TiN film; annealing treatment;

D O I：

10.1016/S0257-8972(00)01138-5

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Titanium nitride films prepared by plasma-assisted chemical vapor deposition (PACVD) on high speed steel were heated in the range of 1073-1373 It. The samples were analyzed by microhardness, XRD, EDX, SEM and XPS. It was found that the annealing temperatures had significant effects on the composition, microstructure and mechanical properties of the films. The chlorine content and lattice parameters of the films were reduced with the rise of the annealing temperature. The microhardness of the films had a minimal value at the annealing temperature of 1173 K. These results were interpreted in terms of the changes of microstructures of the PACVD TiN films. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：237 / 241

页数：5

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