Carbon nitride deposited using energetic species: A review on XPS studies

被引:417
作者
Ronning, C
Feldermann, H
Merk, R
Hofsass, H
Reinke, P
Thiele, JU
机构
[1] Univ Konstanz, Fak Phys, D-78457 Constance, Germany
[2] Univ Basel, Inst Phys, CH-4056 Basel, Switzerland
[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
关键词
D O I
10.1103/PhysRevB.58.2207
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reviews x-ray photoelectron spectroscopy studies on carbon nitride (CN) and reports on results obtained from CN thin films prepared by mass selected ion-beam deposition. The core-level spectra of samples deposited at room temperature show that nitrogen is incorporated into the amorphous network in two different bonding configurations; carbon has three main bonding configurations whose relative contributions vary as a function of the nitrogen content. For samples deposited at elevated temperatures an ordering of the amorphous CN network towards a crystalline graphitelike structure is observed. Furthermore, both deposition at elevated temperatures (350 degrees C) and post-deposition ion irradiation have a strong influence on the bonding configuration in the CN films. Based on these results and the results reported in the reviewed literature a picture of the microstructure of carbon nitride deposited using energetic species is developed.
引用
收藏
页码:2207 / 2215
页数:9
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