Similarities in spatial distributions of absolute GeH2 density, radical production rate and particle amount in GeH4 RF discharges

被引：9

作者：

Kawasaki, H ^{[1
]}

Kida, J ^{[1
]}

Sakamoto, K ^{[1
]}

Fukuzawa, T ^{[1
]}

Shiratani, M ^{[1
]}

Watanabe, Y ^{[1
]}

机构：

[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Dept Elect Device Engn, Fukuoka 8128581, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1998年 / 37卷 / 4B期

关键词：

particle; plasma CVD; RF discharge; GeH4; GeH2;

D O I：

10.1143/JJAP.37.L475

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In order to study the particle growth processes in GeH4 RF discharges, the spatial distribution of the absolute GeH2 density is measured for the first time together with those of particle amount and radical production rate (Ge emission intensity) in a moderately high power range of 0.5-1.0 W/cm(2). The particles are generated and grow around the plasma/sheath boundary near the powered electrode, and the spatial distribution of their amount is similar to those of radical production rate and GeH2 density. Furthermore, GeH2 density is about 10(10) cm(-3), being close to SiH2 density in SiH4 discharges for the similar conditions of RF power and pressure. These results indicate that GeH2 is a highly reactive radical having a high production rate and hence is a candidate for the main contributor to the particle growth.

引用

页码：L475 / L477

页数：3

共 15 条

[1]

Carlile RN, 1996, J VAC SCI TECHNOL A, V14, P489

[2]

CORLISS CH, 1963, NBS MONOGRAPH, V53

[3] Detection of particles in rf silane plasmas using photoemission method [J].

Fukuzawa, T ;

Obata, K ;

Kawasaki, H ;

Shiratani, M ;

Watanabe, Y .

JOURNAL OF APPLIED PHYSICS, 1996, 80 (06) :3202-3207

[4] Study on growth processes of particles in germane radio frequency discharges using laser light scattering and scanning electron microscopic methods [J].

Kawasaki, H ;

Kida, J ;

Sakamoto, K ;

Fukuzawa, T ;

Shiratani, M ;

Watanabe, Y .

JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) :5665-5669

[5] Discharge frequency dependence of particulate growth in high frequency silane plasmas [J].

Kawasaki, H ;

Ueda, Y ;

Yoshioka, T ;

Fukuzawa, T ;

Shiratani, M ;

Watanabe, Y .

APPLIED PHYSICS LETTERS, 1995, 67 (26) :3880-3882

[6] A new ion pitch-angle diagnostic for magnetized plasmas [J].

Lam, S. W. ;

Hershkowitz, N. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (01) :40-48

[7] INFLUENCE OF RF POWER ON PROPERTIES OF A-SI1-XGEX-H PREPARED BY RF GLOW-DISCHARGE DECOMPOSITION [J].

NISHIKAWA, S ;

KAKINUMA, H ;

WATANABE, T ;

NIHEI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (04) :519-523

[8] ACTIVATION-ENERGY AND SPECTROSCOPY OF THE GROWTH OF GERMANIUM FILMS BY ULTRAVIOLET LASER-ASSISTED CHEMICAL VAPOR-DEPOSITION [J].

OSMUNDSEN, JF ;

ABELE, CC ;

EDEN, JG .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) :2921-2930

[9] In situ polarization-sensitive laser-light-scattering method for simultaneous measurements of two-dimensional spatial size and density distributions of particles in plasmas [J].

Shiratani, M ;

Kawasaki, H ;

Fukuzawa, T ;

Watanabe, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (02) :603-607

[10] Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method [J].

Shiratani, M ;

Kawasaki, H ;

Fukuzawa, T ;

Yoshioka, T ;

Ueda, Y ;

Singh, S ;

Watanabe, Y .

JOURNAL OF APPLIED PHYSICS, 1996, 79 (01) :104-109

← 1 2 →