Magnetoresistance of 3d transition-metal-doped epitaxial ZnO thin films

被引:43
作者
Jin, ZW
Hasegawa, K
Fukumura, T
Yoo, YZ
Hasegawa, T
Koinuma, H
Kawasaki, M
机构
[1] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Midori Ku, Yokohama, Kanagawa 2268502, Japan
[2] Japan Sci & Technol Corp, CREST, Shinjuku Ku, Tokyo 1690072, Japan
[3] Tokyo Inst Technol, Frontier Collaborat Res Ctr, Yokohama, Kanagawa 2268502, Japan
[4] Tokyo Inst Technol, COMET, Yokohama, Kanagawa 2268502, Japan
[5] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268502, Japan
来源
PHYSICA E | 2001年 / 10卷 / 1-3期
基金
日本学术振兴会;
关键词
epitaxial ZnO thin films; 3d transition metals; Magnetoresistance; s-d exchange interaction;
D O I
10.1016/S1386-9477(01)00094-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Epitaxial ZnO thin films co-doped with 3d transition metal (TM) (TM = Cr, Mn, Fe, Co, Ni and Cu) and 1 mol% Al were fabricated as a series of oxide-diluted magnetic semiconductors by pulsed-laser-deposition method. Magnetoresistance (MR) of the films was measured to investigate the s-d exchange interaction between the conducting s electron spins and the d electron spins localized at the magnetic TM impurities. A variety of MR behaviors were observed depending on the different TM impurities. It is deduced that the negative MR behavior in the vicinity of zero held is originated from an electron weak-localization effect. Caused by the s-d exchange interaction, the increase of Thomas-Fermi radius R, and the decrease of spin-disorder scattering with increasingly aligned spins of the TM ion impurities are responsible respectively for the positive and negative MR in the higher magnetic filed. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:256 / 259
页数:4
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