Fabrication of transparent p-n hetero-junction diodes by p-diamond film and n-ZnO film

被引:51
作者
Wang, CX
Yang, GW
Zhang, TC
Liu, HW
Han, YH
Luo, JF
Gao, CX [1 ]
Zou, GT
机构
[1] Jilin Univ, State Key Lab Superhard Mat, Changchun 130012, Peoples R China
[2] Sun Yat Sen Univ, Sch Phys & Engn, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Peoples R China
基金
中国国家自然科学基金;
关键词
diamond film; diode; transparent; ZnO;
D O I
10.1016/S0925-9635(03)00237-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO/diamond hetero-junction diodes have been fabricated for the first time. The structure of the diode was n-type ZnO film/p-type diamond film on the {1111} surface of a crystalline diamond. The contact between the n- and p-type semiconductors was found to be improved. The ratio of forward current to the reverse current exceeded 120 within the range of applied voltages of -4 to +4 V. The diode possessed an optical transmission of 50-70% in 500-700 nm wavelength regions. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1548 / 1552
页数:5
相关论文
共 34 条
[1]   Diamond junction FETs based on δ-doped channels [J].
Aleksov, A ;
Vescan, A ;
Kunze, M ;
Gluche, P ;
Ebert, W ;
Kohn, E ;
Bergmaier, A ;
Dollinger, G .
DIAMOND AND RELATED MATERIALS, 1999, 8 (2-5) :941-945
[2]   ZnO diode fabricated by excimer-laser doping [J].
Aoki, T ;
Hatanaka, Y ;
Look, DC .
APPLIED PHYSICS LETTERS, 2000, 76 (22) :3257-3258
[3]   OBSERVATION OF SURFACE-CHARGE SCREENING AND FERMI-LEVEL PINNING ON A SYNTHETIC, BORON-DOPED DIAMOND [J].
BAKER, SM ;
ROSSMAN, GR ;
BALDESCHWIELER, JD .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) :4015-4019
[4]  
CHEN M, 1999, THESIS I METAL RES
[5]   High-voltage Schottky diode on epitaxial diamond layer [J].
Ebert, W ;
Vescan, A ;
Gluche, P ;
Borst, T ;
Kohn, E .
DIAMOND AND RELATED MATERIALS, 1997, 6 (2-4) :329-332
[6]   HIGH-TEMPERATURE POINT-CONTACT TRANSISTORS AND SCHOTTKY DIODES FORMED ON SYNTHETIC BORON-DOPED DIAMOND [J].
GEIS, MW ;
RATHMAN, DD ;
EHRLICH, DJ ;
MURPHY, RA ;
LINDLEY, WT .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (08) :341-343
[7]   HIGH-TEMPERATURE THIN-FILM DIAMOND FIELD-EFFECT TRANSISTOR FABRICATED USING A SELECTIVE GROWTH METHOD [J].
GILDENBLAT, GS ;
GROT, SA ;
HATFIELD, CW ;
BADZIAN, AR .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (02) :37-39
[8]   HIGH-TEMPERATURE SCHOTTKY DIODES WITH THIN-FILM DIAMOND BASE [J].
GILDENBLAT, GS ;
GROT, SA ;
HATFIELD, CW ;
BADZIAN, AR ;
BADZIAN, T .
IEEE ELECTRON DEVICE LETTERS, 1990, 11 (09) :371-372
[9]   DIAMOND THIN-FILM RECESSED GATE FIELD-EFFECT TRANSISTORS FABRICATED BY ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING [J].
GROT, SA ;
GILDENBLAT, GS ;
BADZIAN, AR .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (09) :462-464
[10]   EVAPORATED SN-DOPED IN2O3 FILMS - BASIC OPTICAL-PROPERTIES AND APPLICATIONS TO ENERGY-EFFICIENT WINDOWS [J].
HAMBERG, I ;
GRANQVIST, CG .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (11) :R123-R159