Composition and structure of enriched alloy layers in filmed Al alloys studied by medium-energy ion scattering

被引：19

作者：

Bailey, P ^{[1
]}

Skeldon, P

Noakes, TCQ

Thompson, GE

Sakairi, M

Habazaki, H

Shimizu, K

机构：

[1] CLRC, Daresbury Lab, Warrington WA4 4AD, Cheshire, England

[2] Univ Manchester, Inst Sci & Technol, Ctr Corros & Protect, Manchester M60 1QD, Lancs, England

[3] Hokkaido Univ, Grad Sch Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan

[4] Keio Univ, Univ Chem Lab, Yokohama, Kanagawa 223, Japan

来源：

SURFACE AND INTERFACE ANALYSIS | 2001年 / 31卷 / 06期

关键词：

aluminium; alloys; copper; depth profiling; MEIS;

D O I：

10.1002/sia.1098

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The topmost 20 nm of an electropolished Al-1 at.% Cu alloy has been investigated at sub-nanometre resolution using medium-energy ion scattering. Differences in the composition and depth of the enriched Cu layer are observed. Most significantly, the enriched layer contains regions of differing structure and/or lattice orientation with Cu atoms located in distinct ordered regions, consist ent with the presence of Cu-rich clusters, Surface-segregated Si and Cu are observed and CI and Cu are found in the oxide. Copyright (C) 2001 John Wiley & Sons, Ltd.

引用

页码：480 / 483

页数：6

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