Correlation between in situ optical emission spectroscopy in a reactive Ar/O2 rf magnetron sputtering discharge and Pb(ZrxTi1-x)O3 thin film composition

被引：12

作者：

Ayguavives, F

Ea-Kim, B

Aubert, P

Agius, B

Bretagne, J

机构：

[1] Univ Paris Sud, Lab Etud Mat Films Minces, F-91400 Orsay, France

[2] Univ Paris Sud, Phys Gaz & Plasmas Lab, UA CNRS, F-91400 Orsay, France

来源：

APPLIED PHYSICS LETTERS | 1998年 / 73卷 / 08期

关键词：

D O I：

10.1063/1.122072

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Lead zirconate titanate Pb(ZrxTi(1-x))O-3 (PZT) thin films have been deposited by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb-1.1(Zr0.4Ti0.6) in a reactive argon/oxygen gas mixture. During plasma deposition, in situ optical emission spectroscopy measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities Zr-386.4 nm, Ti-399.9 nm, Pb-405.8 nm, and O-777.2 nm and the thin-film composition determined by a simultaneous use of Rutherford backscattering spectroscopy and nuclear reaction analysis. (C) 1998 American Institute of Physics. [S0003-6951(98)01734-3].

引用

页码：1023 / 1025

页数：3

共 16 条

[1]

AMEEN MS, 1990, MATER RES SOC SYMP P, V200, P65, DOI 10.1557/PROC-200-65

[2] MODELING OF REACTIVE SPUTTERING OF COMPOUND MATERIALS [J].