Electron energy distribution functions and the influence on fluorocarbon plasma chemistry

被引:61
作者
Sugai, H [1 ]
Ghanashev, I [1 ]
Hosokawa, M [1 ]
Mizuno, K [1 ]
Nakamura, K [1 ]
Toyoda, H [1 ]
Yamauchi, K [1 ]
机构
[1] Nagoya Univ, Dept Elect Engn, Chikusu Ku, Nagoya, Aichi 4648603, Japan
关键词
D O I
10.1088/0963-0252/10/2/327
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Two different modes of electron heating are found in microwave discharges: the bulk heating mode characterized with low electron density n(e) and high electron temperature T-e (similar to 10 eV), and the surface heating mode with high n(e) and low T-e (similar to3 eV). The correlation between the heating mode and the electron energy distribution function (EEDF) is qualitatively interpreted in terms of non-local kinetic theory, taking account of the ambipolar potential well. A biased optical probe diagnostics of a surface wave plasma (SWP) reveals that the surface heating mode gives a bi-Maxwellian type EEDF, that is, a sum of two Maxwellian distributions of bulk temperature T-b and tail temperature T-t > T-b. On the other hand, the EEDF of inductively coupled plasma (ICP) is close to a single-Maxwellian distribution with electron temperature higher than the bulk temperature Tb of the SWP. Such differences in the EEDFs make the composition of the reactive species of the two plasmas different; namely, ion and radical measurements at the same electron density show that the ICP contains more F radicals and less CF3 and CF2 radicals in comparison with the SWP. In addition, a simplified model based on the bi-Maxwellian EEDF shows how the EEDF determines the ion and radical compositions, supporting the major experimental results. These observations and calculations suggest that plasma chemistry is controllable by tailoring the EEDF with proper adjustment of bulk heating and/or surface heating of electrons.
引用
收藏
页码:378 / 385
页数:8
相关论文
共 17 条
[1]   A NEW TECHNOLOGY FOR NEGATIVE-ION DETECTION AND THE RAPID ELECTRON COOLING IN A PULSED HIGH-DENSITY ETCHING PLASMA [J].
AHN, TH ;
NAKAMURA, K ;
SUGAI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (10B) :L1405-L1408
[2]   Fast modelling of low-pressure radio-frequency collisional capacitively coupled discharge and investigation of the formation of a non-Maxwellian electron distribution function [J].
Berezhnoi, SV ;
Kaganovich, ID ;
Tsendin, LD .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (03) :268-281
[3]   Multiple eigenmode analysis and density jumps in planar surface-wave plasmas with slot-antenna excitation [J].
Ghanashev, I ;
Sugai, H .
PHYSICS OF PLASMAS, 2000, 7 (07) :3051-3061
[4]   Local resonant excitation of plasma oscillations in a planar surface-wave plasma device [J].
Ghanashev, I ;
Sugai, H ;
Morita, S ;
Toyoda, N .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (03) :363-369
[5]   ABNORMALLY LOW ELECTRON-ENERGY AND HEATING-MODE TRANSITION IN A LOW-PRESSURE ARGON RF DISCHARGE AT 13.56 MHZ [J].
GODYAK, VA ;
PIEJAK, RB .
PHYSICAL REVIEW LETTERS, 1990, 65 (08) :996-999
[6]   Low temperature growth of amorphous and polycrystalline silicon films from a modified inductively coupled plasma [J].
Goto, M ;
Toyoda, H ;
Kitagawa, M ;
Hirao, T ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (6A) :3714-3720
[7]   Diagnostic of surface wave plasma for oxide etching in comparison with inductive RF plasma [J].
Kokura, H ;
Yoneda, S ;
Nakamura, K ;
Mitsuhira, N ;
Nakamura, M ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (9A) :5256-5261
[8]   Dependence of fluorocarbon plasma chemistry on the electron energy distribution function [J].
Kokura, H ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (5A) :2847-2853
[9]   Plasma absorption probe for measuring electron density in an environment soiled with processing plasmas [J].
Kokura, H ;
Nakamura, K ;
Ghanashev, IP ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (9A) :5262-5266
[10]   Determination of electron temperatures in plasmas by multiple rare gas optical emission, and implications for advanced actinometry [J].
Malyshev, MV ;
Donnelly, VM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (03) :550-558