Ion beam modification for submicron technology

被引：7

作者：

Kalbitzer, S

Wilbertz, C

Miller, T

Knoblauch, A

机构：

[1] Max-Planck-Inst. für Kernphysik, D-69029 Heidelberg

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1996年 / 113卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)01321-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Finely focused ion beams with target-current densities of about 100 A/cm(2) are a promising tool for material modification in the nanometer range. A brief outline of the basic source developments will be given as well as some typical examples of nanostructuring of materials.

引用

页码：154 / 160

页数：7

共 27 条

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