One-step micropatterning of highly-ordered semi-crystalline poly(vinylidene fluoride-co-trifluoroethylene) films by a selective shear and detachment process

被引:8
作者
Chang, Jiyoun [1 ]
Jung, Hee Joon [1 ]
Jeong, Huisu [2 ]
Park, Youn Jung [1 ]
Sung, Jinwoo [1 ]
Kang, Seok Ju [1 ]
Jung, Gun Young [2 ]
Sung, Myung M. [3 ]
Park, Cheolmin [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
[2] GIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[3] Hanyang Univ, Dept Chem, Seoul 133791, South Korea
关键词
Ferroelectric polymer; Static shear; Detachment; Micropattern; Crystal orientation; Non-volatile memory; THIN-FILMS; FLUORIDE); DEVICES; CRYSTALLIZATION; POLARIZATION; TRANSISTORS; MEMORIES; CRYSTALS;
D O I
10.1016/j.orgel.2010.10.007
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a one-step route for micropatterning a thin ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film with both molecular and microstructural crystal control over a large area. The method is based on the static mechanical shearing and ;subsequent detachment of a film spin coated on pre-patterned Al which has been lithographically prepared on a SiO2 substrate under appropriate thermal conditions. Selective detachment of the film in contact with the SiO2 substrate gave rise to micropatterns of PVDF-TrFE film positioned only on the Al regions. Further, the PVDF-TrFE film showed 25-nm-thick crystalline lamellae aligned perpendicular to the shear direction, wherein the c axis of the crystals was globally ordered parallel to the shear direction. The sheared and patterned PVDF-TrFE thin films are readily incorporated into non-volatile memory units of metal/ferroelectric/metal capacitors and bottom gate-top contact field effect transistors, leading to arrays of memory devices with enhanced performance. (C) 2010 Elsevier B. V. All rights reserved.
引用
收藏
页码:98 / 107
页数:10
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