Surface photoabsorption study of the effects of growth temperature and V/III ratio on ordering in GaInP

被引:64
作者
Murata, H [1 ]
Ho, IH [1 ]
Su, LC [1 ]
Hosokawa, Y [1 ]
Stringfellow, GB [1 ]
机构
[1] UNIV UTAH, DEPT MAT SCI & ENGN, SALT LAKE CITY, UT 84112 USA
关键词
D O I
10.1063/1.361430
中图分类号
O59 [应用物理学];
学科分类号
摘要
Surface photoabsorption (SPA) measurements were used to clarify the Cu-Pt ordering mechanism in Ga0.5In0.5P layers grown by organometallic vapor phase epitaxy. The Cu-Pt ordering is strongly affected by the growth temperature and the input partial pressure of the phosphorus precursor, i.e., the V/III ratio. SPA was used to measure the concentration of [(1) over bar 10]-oriented phosphorus dimers on the surface, which are characteristics of the (2X4) reconstruction, as a function of the growth temperature and V/III ratio. The degree of order decreases markedly with increasing growth temperature above 620 degrees C at a constant V/III ratio of 40 [tertiarybutylphosphine (TBP) partial pressure of 50 Pa]. This corresponds directly to a decrease of the P-dimer concentration on the surface. Below 620 degrees C, the degree of order decreases as the growth temperature decreases, even though the concentration of P dimers increases. This is most likely due to the slow migration of adatoms on the surface during growth. The degree of order is found to decrease monotonically with decreasing V/III ratio in the range from 160 to 8 at 670 degrees C. This corresponds directly to the decrease of the P-dimer concentration on the surface. The direct correlation of the [(1) over bar 10] -oriented phosphorus dimer concentration and the degree of order with changes in both temperature (greater than or equal to 620 degrees C) and V/III ratio suggests that the (2X4) surface reconstruction is necessary to form the Cu-Pt structure, in agreement with published theoretical studies. The physical structure of the surface of these Ga0.5In0.5P layers was also characterized, using atomic force microscopy. For growth at 670 degrees C and a V/III ratio of 160, the structure of the layers growth on exactly (001) oriented GaAs substrates consists of islands surrounded mainly by bilayer (approximately 6 Angstrom) steps. As the V/III ratio is reduced, the step height transforms to one monolayer. Exclusively monolayer steps are formed at a V/III ratio of 8. This is interpreted in terms of the stabilization of the bilayers by formation of the (2X2) reconstruction on the (111)B step face at high V/III ratios. (C) 1996 American Institute of Physics.
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页码:6895 / 6899
页数:5
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