Preparation of Co-Cr alloy/Ni-Zn ferrite doublelayered films for perpendicular magnetic tape

被引:1
作者
Kitamoto, Y
Abe, M
Naoe, M
机构
[1] Department of Physical Electronics, Tokyo Institute of Technology O-okayama, Meguro-ku, Tokyo
关键词
D O I
10.1109/20.539188
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Co-Cr alloy / Ni-Zn ferrite doublelayered films for perpendicular magnetic recording tape are proposed to improve high frequency characteristics, and their preparation is described. The films were deposited by the ''Ferrite Plating'' method which enables to synthesize the soft magnetic spinel ferrite layers at low temperatures below 100 degrees C and by the facing targets sputtering (FTS) for the Co-Cr layers. It was found that the Co-Cr layers need to compensate the tensile internal stress of 1.0-1.5x10(9)dyn/cm(2) in the ferrite plated backlayers to avoid curling of the tape and to improve adhesion of the backlayers to substrates, and Ar pressure of 0.2-0.3mTorr in the FTS was proper for depositing the Co-Cr layers with the optimum compressive stress and the excellent crystallinity.
引用
收藏
页码:3834 / 3836
页数:3
相关论文
共 9 条
[1]   PLATING OF FERRITE FILM ON 8'' DISK AT 70-DEGREES-C BY SPRAY-SPIN-COATING METHOD [J].
ABE, M ;
TAMAURA, Y ;
OISHI, M ;
SAITOH, T ;
ITOH, T ;
GOMI, M .
IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (05) :3432-3434
[2]   FERRITE PLATING IN AQUEOUS-SOLUTION - NEW TECHNIQUE FOR PREPARING MAGNETIC THIN-FILM [J].
ABE, M ;
TAMAURA, Y .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (06) :2614-2616
[3]   INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].
HOFFMAN, DW ;
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358
[4]   PERPENDICULAR MAGNETIC RECORDING WITH A COMPOSITE ANISOTROPY FILM [J].
IWASAKI, S ;
NAKAMURA, Y ;
OUCHI, K .
IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (06) :1456-1458
[5]   STRESS IN VACUUM DEPOSITED FILMS OF SILVER [J].
KINOSITA, K ;
MAKI, K ;
NAKAMIZO, K ;
TAKEUCHI, K .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1967, 6 (01) :42-+
[6]  
NAKAGAWA S, 1991, J MAG SOC JPN S2, V15, P27
[7]   THE MICROSTRUCTURE OF SPUTTER-DEPOSITED COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :3059-3065
[8]   INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :666-670
[9]  
YAMAMOTO S, 1991, J MAG SOC JPN S2, V15, P293