THE MICROSTRUCTURE OF SPUTTER-DEPOSITED COATINGS

[1] PLANARIZATION BY RADIO-FREQUENCY BIAS SPUTTERING OF ALUMINUM AS STUDIED EXPERIMENTALLY AND BY COMPUTER-SIMULATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2167 - 2171

[2] CAUSALITY BOUND ON THE DENSITY OF AGGREGATES [J]. PHYSICAL REVIEW A, 1984, 29 (05): : 2966 - 2967

[3] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 671 - 674

[4] BROPHY JH, 1964, STRUCTURE PROPERTIES, V2, P82

[5] EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02): : 205 - 215

[6] COLUMNAR GRAINS AND TWINS IN HIGH-PURITY SPUTTER-DEPOSITED COPPER [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 832 - 836

[7] DAHLGREN SD, 1977, THIN SOLID FILMS, V40, P435

[8] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J]. THIN SOLID FILMS, 1977, 47 (03) : 219 - 233

[9] MICROPOROSITY IN 304 STAINLESS-STEEL FILMS PREPARED BY VAPOR QUENCHING [J]. THIN SOLID FILMS, 1985, 128 (1-2) : 57 - 66

[10] HYDROGEN CONTENT AND DENSITY OF PLASMA-DEPOSITED AMORPHOUS SILICON-HYDROGEN [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) : 3366 - 3369

[1] PLANARIZATION BY RADIO-FREQUENCY BIAS SPUTTERING OF ALUMINUM AS STUDIED EXPERIMENTALLY AND BY COMPUTER-SIMULATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2167 - 2171

[2] CAUSALITY BOUND ON THE DENSITY OF AGGREGATES [J]. PHYSICAL REVIEW A, 1984, 29 (05): : 2966 - 2967

[3] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 671 - 674

[4] BROPHY JH, 1964, STRUCTURE PROPERTIES, V2, P82

[5] EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02): : 205 - 215

[6] COLUMNAR GRAINS AND TWINS IN HIGH-PURITY SPUTTER-DEPOSITED COPPER [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 832 - 836

[7] DAHLGREN SD, 1977, THIN SOLID FILMS, V40, P435

[8] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J]. THIN SOLID FILMS, 1977, 47 (03) : 219 - 233

[9] MICROPOROSITY IN 304 STAINLESS-STEEL FILMS PREPARED BY VAPOR QUENCHING [J]. THIN SOLID FILMS, 1985, 128 (1-2) : 57 - 66

[10] HYDROGEN CONTENT AND DENSITY OF PLASMA-DEPOSITED AMORPHOUS SILICON-HYDROGEN [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) : 3366 - 3369