THE MICROSTRUCTURE OF SPUTTER-DEPOSITED COATINGS

[41] MULLER KH, 1985, J APPL PHYS, V58, P2573, DOI 10.1063/1.335885

[42] MULLER KH, 1986, J VAC SCI TECHNOL A, V4, P184, DOI 10.1116/1.573468

[43] MICROPOROSITY INDUCED BY NUCLEATION AND GROWTH PROCESSES IN CRYSTALLINE AND NON-CRYSTALLINE FILMS [J]. THIN SOLID FILMS, 1977, 45 (03) : 421 - 432

[44] DYNAMICS OF FRACTAL NETWORKS [J]. SCIENCE, 1986, 231 (4740) : 814 - 819

[45] ROOM-TEMPERATURE RECRYSTALLIZATION IN THICK BIAS-SPUTTERED COPPER DEPOSITS [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) : 4371 - +

[46] INFLUENCES OF SURFACE-TOPOGRAPHY AND ANGLE OF ADATOM INCIDENCE ON GROWTH-STRUCTURE IN SPUTTERED CHROMIUM [J]. THIN SOLID FILMS, 1979, 63 (01) : 121 - 129

[47] COLUMNAR GRAIN-STRUCTURE IN THICK SPUTTERED NICKEL [J]. THIN SOLID FILMS, 1981, 75 (03) : 205 - 211

[48] THEORY OF BALLISTIC AGGREGATION [J]. PHYSICAL REVIEW LETTERS, 1985, 54 (16) : 1828 - 1831

[49] THE EFFECTS OF HYDROGEN PARTIAL-PRESSURE ON REACTIVELY SPUTTERED AMORPHOUS-SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) : 347 - 351

[50] MICROSTRUCTURE AND PROPERTIES OF RF-SPUTTERED AMORPHOUS HYDROGENATED SILICON FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (08) : 5329 - 5339

[41] MULLER KH, 1985, J APPL PHYS, V58, P2573, DOI 10.1063/1.335885

[42] MULLER KH, 1986, J VAC SCI TECHNOL A, V4, P184, DOI 10.1116/1.573468

[43] MICROPOROSITY INDUCED BY NUCLEATION AND GROWTH PROCESSES IN CRYSTALLINE AND NON-CRYSTALLINE FILMS [J]. THIN SOLID FILMS, 1977, 45 (03) : 421 - 432

[44] DYNAMICS OF FRACTAL NETWORKS [J]. SCIENCE, 1986, 231 (4740) : 814 - 819

[45] ROOM-TEMPERATURE RECRYSTALLIZATION IN THICK BIAS-SPUTTERED COPPER DEPOSITS [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) : 4371 - +

[46] INFLUENCES OF SURFACE-TOPOGRAPHY AND ANGLE OF ADATOM INCIDENCE ON GROWTH-STRUCTURE IN SPUTTERED CHROMIUM [J]. THIN SOLID FILMS, 1979, 63 (01) : 121 - 129

[47] COLUMNAR GRAIN-STRUCTURE IN THICK SPUTTERED NICKEL [J]. THIN SOLID FILMS, 1981, 75 (03) : 205 - 211

[48] THEORY OF BALLISTIC AGGREGATION [J]. PHYSICAL REVIEW LETTERS, 1985, 54 (16) : 1828 - 1831

[49] THE EFFECTS OF HYDROGEN PARTIAL-PRESSURE ON REACTIVELY SPUTTERED AMORPHOUS-SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) : 347 - 351

[50] MICROSTRUCTURE AND PROPERTIES OF RF-SPUTTERED AMORPHOUS HYDROGENATED SILICON FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (08) : 5329 - 5339