Deposition and characteristics of CdO films with absolutely (200)-preferred orientation

被引:45
作者
Ma, DW [1 ]
Ye, ZZ [1 ]
Wang, L [1 ]
Huang, JY [1 ]
Zhao, BH [1 ]
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
基金
中国国家自然科学基金;
关键词
CdO; (200)-oriented; thin films; semiconductor; optical materials and properties; electrical properties; dc reactive magnetron sputtering;
D O I
10.1016/S0167-577X(03)00429-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CdO crystal thin films with (200)-preferred orientation have been prepared on Si and glass substrates by dc reactive magnetron sputtering method. At an optimum substrate temperature of 375degreesC, the film has the best crystal quality. By the electrical and transmittance measurements the film shows large carrier concentration of 2.00 x 10(20)/cm(3), Hall mobility of 64 cm(2)/N s, resistivity of 4.87 x 10(-4) Omega cm and a high average transmittance over 80% in the visible region together with a direct band gap of 2.43 eV. In view of the Burstein-Moss (BM) shift, theoretical calculations show that the film has a direct band gap of 2.17 eV, close to its intrinsic band gap of 2.2 eV. The photoluminescence (PL) measurement shows that the pure CdO film has no luminescence behavior, but it can alloy with ZnO to realize its applications in luminescent devices. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:128 / 131
页数:4
相关论文
共 12 条
[1]   Single-crystalline rocksalt CdO layers grown on GaAs(001) substrates by metalorganic molecular-beam epitaxy [J].
Ashrafi, ABMA ;
Kumano, H ;
Suemune, I ;
Ok, YW ;
Seong, TY .
APPLIED PHYSICS LETTERS, 2001, 79 (04) :470-472
[2]   High transmittance CdO thin films obtained by the sol-gel method [J].
Carballeda-Galicia, DM ;
Castanedo-Pérez, R ;
Jiménez-Sandoval, O ;
Jiménez-Sandoval, S ;
Torres-Delgado, G ;
Zúñiga-Romero, CI .
THIN SOLID FILMS, 2000, 371 (1-2) :105-108
[3]   Influence of F-doping on the transmittance and electron affinity of CdO thin films suitable for solar cells technology [J].
Ferro, R ;
Rodríguez, JA .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2000, 64 (04) :363-370
[4]   TEXTURED ALUMINUM-DOPED ZINC-OXIDE THIN-FILMS FROM ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR DEPOSITION [J].
HU, JH ;
GORDON, RG .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (02) :880-890
[5]   Effect of deposition temperature on spray deposited cadmium oxide films [J].
Lokhande, BJ ;
Uplane, MD .
MATERIALS RESEARCH BULLETIN, 2001, 36 (3-4) :439-447
[6]   Fabrication of cadmium oxide thin films using the Langmuir-Blodgett deposition technique [J].
Matsuura, N ;
Johnson, DJ ;
Amm, DT .
THIN SOLID FILMS, 1997, 295 (1-2) :260-265
[7]   Optoelectronic properties of CdO/Si photodetectors [J].
Ortega, M ;
Santana, G ;
Morales-Acevedo, A .
SOLID-STATE ELECTRONICS, 2000, 44 (10) :1765-1769
[8]   Characterisation of CdO thin films deposited by activated reactive evaporation [J].
Reddy, KTR ;
Sravani, C ;
Miles, RW .
JOURNAL OF CRYSTAL GROWTH, 1998, 184 :1031-1034
[9]   Preparation and characterization of CdO films deposited by dc magnetron reactive sputtering [J].
Subramanyam, TK ;
Uthanna, S ;
Naidu, BS .
MATERIALS LETTERS, 1998, 35 (3-4) :214-220
[10]   Band-gap widening of CdO thin films [J].
Ueda, N ;
Maeda, H ;
Hosono, H ;
Kawazoe, H .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (11) :6174-6177