Ultrafast laser fabrication of submicrometer pores in borosilicate glass

被引：41

作者：

An, Ran ^{[1
,2
]}

Uram, Jeffrey D. ^{[1
]}

Yusko, Erik C. ^{[1
]}

Ke, Kevin ^{[1
,2
]}

Mayer, Michael ^{[1
,3
]}

Hunt, Alan J. ^{[1
,2
]}

机构：

[1] Univ Michigan, Dept Biomed Engn, Ann Arbor, MI 48109 USA

[2] Univ Michigan, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA

[3] Univ Michigan, Dept Chem Engn, Ann Arbor, MI 48109 USA

来源：

OPTICS LETTERS | 2008年 / 33卷 / 10期

关键词：

D O I：

10.1364/OL.33.001153

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate rapid fabrication of submicrometer-diameter pores in borosilicate glass using femtosecond laser machining and subsequent wet-etch techniques. This approach allows direct and repeatable fabrication of high-quality pores with diameters of 400-800 nm. Such small pores coupled with the desirable electrical and chemical properties of glass enable sensitive resistive-pulse analysis to determine the size and concentration of macromolecules and nanoparticles. Plasma-enhanced chemical vapor deposition allows further reduction of pore diameters to below 300 nm. (C) 2008 Optical Society of America.

引用

页码：1153 / 1155

页数：3

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