共 17 条
[1]
A novel resistance memory with high scalability and nanosecond switching
[J].
Aratani, K.
;
Ohba, K.
;
Mizuguchi, T.
;
Yasuda, S.
;
Shiimoto, T.
;
Tsushima, T.
;
Sone, T.
;
Endo, K.
;
Kouchiyama, A.
;
Sasaki, S.
;
Maesaka, A.
;
Yamada, N.
;
Narisawa, H.
.
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2,
2007,
:783-786

Aratani, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Ohba, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Mizuguchi, T.
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机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Yasuda, S.
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机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Shiimoto, T.
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机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Tsushima, T.
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机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Sone, T.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Endo, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Kouchiyama, A.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Sasaki, S.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Maesaka, A.
论文数: 0 引用数: 0
h-index: 0
机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Yamada, N.
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机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan

Narisawa, H.
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机构:
Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan Sony Corp, Informat Technol Labs, Solid State Memories Res Lab, Kanagawa 2430021, Japan
[2]
Highly scalable non-volatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses
[J].
Baek, IG
;
Lee, MS
;
Seo, S
;
Lee, MJ
;
Seo, DH
;
Suh, DS
;
Park, JC
;
Park, SO
;
Kim, HS
;
Yoo, IK
;
Chung, UI
;
Moon, JT
.
IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST,
2004,
:587-590

Baek, IG
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Lee, MS
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Seo, S
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Lee, MJ
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Seo, DH
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Suh, DS
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Park, JC
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Park, SO
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Kim, HS
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Yoo, IK
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Chung, UI
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Moon, JT
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea
[3]
Synthesis and solid-state NMR structural characterization of 13C-labeled graphite oxide
[J].
Cai, Weiwei
;
Piner, Richard D.
;
Stadermann, Frank J.
;
Park, Sungjin
;
Shaibat, Medhat A.
;
Ishii, Yoshitaka
;
Yang, Dongxing
;
Velamakanni, Aruna
;
An, Sung Jin
;
Stoller, Meryl
;
An, Jinho
;
Chen, Dongmin
;
Ruoff, Rodney S.
.
SCIENCE,
2008, 321 (5897)
:1815-1817

Cai, Weiwei
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA
Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100080, Peoples R China Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Piner, Richard D.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Stadermann, Frank J.
论文数: 0 引用数: 0
h-index: 0
机构:
Washington Univ, Space Sci Lab, Dept Phys, St Louis, MO 63130 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Park, Sungjin
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Shaibat, Medhat A.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Chem, Chicago, IL 60607 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Ishii, Yoshitaka
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Chem, Chicago, IL 60607 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Yang, Dongxing
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Velamakanni, Aruna
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

论文数: 引用数:
h-index:
机构:

Stoller, Meryl
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

An, Jinho
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Chen, Dongmin
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100080, Peoples R China Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

Ruoff, Rodney S.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
[4]
Atomic-Layer-Deposited HfLaO-Based Resistive Switching Memories With Superior Performance
[J].
Chen, Lin
;
Xu, Yan
;
Sun, Qing-Qing
;
Zhou, Peng
;
Wang, Peng-Fei
;
Ding, Shi-Jin
;
Zhang, David Wei
.
IEEE ELECTRON DEVICE LETTERS,
2010, 31 (11)
:1296-1298

Chen, Lin
论文数: 0 引用数: 0
h-index: 0
机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China

Xu, Yan
论文数: 0 引用数: 0
h-index: 0
机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China

Sun, Qing-Qing
论文数: 0 引用数: 0
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机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China

Zhou, Peng
论文数: 0 引用数: 0
h-index: 0
机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China

Wang, Peng-Fei
论文数: 0 引用数: 0
h-index: 0
机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China

Ding, Shi-Jin
论文数: 0 引用数: 0
h-index: 0
机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China

Zhang, David Wei
论文数: 0 引用数: 0
h-index: 0
机构:
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China
[5]
Nonvolatile resistive switching in graphene oxide thin films
[J].
He, C. L.
;
Zhuge, F.
;
Zhou, X. F.
;
Li, M.
;
Zhou, G. C.
;
Liu, Y. W.
;
Wang, J. Z.
;
Chen, B.
;
Su, W. J.
;
Liu, Z. P.
;
Wu, Y. H.
;
Cui, P.
;
Li, Run-Wei
.
APPLIED PHYSICS LETTERS,
2009, 95 (23)

He, C. L.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Zhuge, F.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Zhou, X. F.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Li, M.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Zhou, G. C.
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h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Liu, Y. W.
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h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Wang, J. Z.
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h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Chen, B.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Su, W. J.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Liu, Z. P.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Wu, Y. H.
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Cui, P.
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

Li, Run-Wei
论文数: 0 引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
[6]
Analysis on switching mechanism of graphene oxide resistive memory device
[J].
Hong, Seul Ki
;
Kim, Ji Eun
;
Kim, Sang Ouk
;
Cho, Byung Jin
.
JOURNAL OF APPLIED PHYSICS,
2011, 110 (04)

Hong, Seul Ki
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Kim, Ji Eun
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Kim, Sang Ouk
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Cho, Byung Jin
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea
[7]
Flexible Resistive Switching Memory Device Based on Graphene Oxide
[J].
Hong, Seul Ki
;
Kim, Ji Eun
;
Kim, Sang Ouk
;
Choi, Sung-Yool
;
Cho, Byung Jin
.
IEEE ELECTRON DEVICE LETTERS,
2010, 31 (09)
:1005-1007

Hong, Seul Ki
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Kim, Ji Eun
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Kim, Sang Ouk
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Choi, Sung-Yool
论文数: 0 引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Taejon 305700, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

Cho, Byung Jin
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea
[8]
Reset-Set Instability in Unipolar Resistive-Switching Memory
[J].
Ielmini, Daniele
.
IEEE ELECTRON DEVICE LETTERS,
2010, 31 (06)
:552-554

Ielmini, Daniele
论文数: 0 引用数: 0
h-index: 0
机构:
Politecn Milan, Dipartimento Elettron & Informaz, I-20133 Milan, Italy
IU NET, I-20133 Milan, Italy Politecn Milan, Dipartimento Elettron & Informaz, I-20133 Milan, Italy
[9]
Graphene Oxide Thin Films for Flexible Nonvolatile Memory Applications
[J].
Jeong, Hu Young
;
Kim, Jong Yun
;
Kim, Jeong Won
;
Hwang, Jin Ok
;
Kim, Ji-Eun
;
Lee, Jeong Yong
;
Yoon, Tae Hyun
;
Cho, Byung Jin
;
Kim, Sang Ouk
;
Ruoff, Rodney S.
;
Choi, Sung-Yool
.
NANO LETTERS,
2010, 10 (11)
:4381-4386

Jeong, Hu Young
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea ETRI, Taejon 305700, South Korea

Kim, Jong Yun
论文数: 0 引用数: 0
h-index: 0
机构:
ETRI, Taejon 305700, South Korea
Hanyang Univ, Dept Chem, Seoul 133701, South Korea ETRI, Taejon 305700, South Korea

Kim, Jeong Won
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h-index: 0
机构:
KRISS, Taejon 305340, South Korea ETRI, Taejon 305700, South Korea

Hwang, Jin Ok
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea ETRI, Taejon 305700, South Korea

Kim, Ji-Eun
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea ETRI, Taejon 305700, South Korea

Lee, Jeong Yong
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h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea ETRI, Taejon 305700, South Korea

Yoon, Tae Hyun
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h-index: 0
机构:
Hanyang Univ, Dept Chem, Seoul 133701, South Korea ETRI, Taejon 305700, South Korea

Cho, Byung Jin
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea ETRI, Taejon 305700, South Korea

Kim, Sang Ouk
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea ETRI, Taejon 305700, South Korea

Ruoff, Rodney S.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA ETRI, Taejon 305700, South Korea

Choi, Sung-Yool
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ETRI, Taejon 305700, South Korea
UST, Dept Adv Device Technol, Taejon 305333, South Korea ETRI, Taejon 305700, South Korea
[10]
Observation of bistable resistance memory switching in CuO thin films
[J].
Kim, C. H.
;
Jang, Y. H.
;
Hwang, H. J.
;
Sun, Z. H.
;
Moon, H. B.
;
Cho, J. H.
.
APPLIED PHYSICS LETTERS,
2009, 94 (10)

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Hwang, H. J.
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Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea
Pusan Natl Univ, Dept Phys, Pusan 609735, South Korea Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea

Sun, Z. H.
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Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea
Pusan Natl Univ, Dept Phys, Pusan 609735, South Korea Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea

Moon, H. B.
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Nextron Corp, Pusan 609735, South Korea Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea

Cho, J. H.
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Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea
Pusan Natl Univ, Dept Phys, Pusan 609735, South Korea
Pusan Natl Univ, Dept Phys Educ, Pusan 609735, South Korea Pusan Natl Univ, RCDAMP, Pusan 609735, South Korea