Facet formation of uniform InAs quantum dots by molecular beam epitaxy

被引:25
作者
Kaizu, T [1 ]
Yamaguchi, K [1 ]
机构
[1] Univ Electrocommun, Dept Elect Engn, Chofu, Tokyo 1828585, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2003年 / 42卷 / 6B期
关键词
InAs quantum dot; molecular beam epitaxy; Stranski-Krastanov growth mode; self-size-limiting effect; facet; high aspect ratio; uniformity;
D O I
10.1143/JJAP.42.4166
中图分类号
O59 [应用物理学];
学科分类号
摘要
Uniform InAs quantum dots were grown by molecular beam epitaxy via the Stranski-Krastanov (SK) growth mode, and the self-size-limiting effects due to facet formation were investigated. The facet formation of the 3D dots depends on the growth conditions. As the growth rate and the arsenic pressure decrease, the crystal orientation of the facet changes from the {136} plane to the {101} plane. After the self-size-limiting effects due to the facet formation, the surface concentration of indium adatoms increases, and the density of the coalescent dots also increases. The low arsenic pressure and the low growth rate are effective conditions for suppressing the coalescence and reducing the size fluctuation of the coherent 3D dots. As a result, it was found that the uniform formation of the InAs quantum dots can be achieved by conventional SK-mode growth under low growth rate and low arsenic pressure conditions.
引用
收藏
页码:4166 / 4168
页数:3
相关论文
共 8 条
[1]   MULTIDIMENSIONAL QUANTUM WELL LASER AND TEMPERATURE-DEPENDENCE OF ITS THRESHOLD CURRENT [J].
ARAKAWA, Y ;
SAKAKI, H .
APPLIED PHYSICS LETTERS, 1982, 40 (11) :939-941
[2]   Uniform formation of two-dimensional and three-dimensional InAs islands on GaAs by molecular beam epitaxy [J].
Kaizu, T ;
Yamaguchi, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (4A) :1705-1708
[3]   Self size-limiting process of InAs quantum dots grown by molecular beam epitaxy [J].
Kaizu, T ;
Yamaguchi, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (3B) :1885-1887
[4]   Determination of the shape of self-organized InAs/GaAs quantum dots by reflection high energy electron diffraction [J].
Lee, H ;
Lowe-Webb, R ;
Yang, WD ;
Sercel, PC .
APPLIED PHYSICS LETTERS, 1998, 72 (07) :812-814
[5]   Shape transition of InAs quantum dots by growth at high temperature [J].
Saito, H ;
Nishi, K ;
Sugou, S .
APPLIED PHYSICS LETTERS, 1999, 74 (09) :1224-1226
[6]   Stranski-Krastanov growth of InAs quantum dots with narrow size distribution [J].
Yamaguchi, K ;
Yujobo, K ;
Kaizu, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2000, 39 (12A) :L1245-L1248
[7]   Uniform formation process of self-organized InAs quantum dots [J].
Yamaguchi, K ;
Kaizu, T ;
Yujobo, K ;
Saito, Y .
JOURNAL OF CRYSTAL GROWTH, 2002, 237 (1-4 II) :1301-1306
[8]   FABRICATION OF GAAS FINE STRIPE STRUCTURES BY SELECTIVE METALORGANIC CHEMICAL VAPOR-DEPOSITION USING DIETHYLGALLIUMCHLORIDE [J].
YAMAGUCHI, K ;
OKAMOTO, K .
APPLIED PHYSICS LETTERS, 1991, 59 (27) :3580-3582