Atomic-scale electron beam processing

被引：4

作者：

Kizuka, T

Yanaka, T

机构：

[1] Nagoya Univ, Sch Engn, Dept Appl Phys, Chikusa Ku, Nagoya, Aichi 4648603, Japan

[2] Nagoya Univ, Res Ctr Adv Waster & Emiss Management, Chikusa Ku, Nagoya, Aichi 4648603, Japan

[3] Japan Sci & Technol Corp, Precursory Res Embryon Sci & Technol, Chikusa Ku, Nagoya, Aichi 4648603, Japan

[4] TOPCON Corp, Electron Beam Div, Itabashi Ku, Tokyo 174, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 3A期

关键词：

electron beam processing; high-resolution transmission electron microscopy; atomic fabrication; magnesium oxide; in situ microscopy;

D O I：

10.1143/JJAP.38.1595

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Atomic-scale electron beam processing was demonstrated using high-resolution transmission electron microscopy. Nanometer-size holes were produced through magnesium oxide films. The minimum hole size was 0.84 nm and the minimum distance between the holes was 0.63 nm.

引用

页码：1595 / 1595

页数：1

共 9 条

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