Intrinsic point defects in aluminum antimonide

被引:37
作者
Aberg, Daniel [1 ]
Erhart, Paul [1 ]
Williamson, Andrew J. [1 ]
Lordi, Vincenzo [1 ]
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
关键词
D O I
10.1103/PhysRevB.77.165206
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Calculations within density functional theory on the basis of the local density approximation are carried out to study the properties of intrinsic point defects in aluminum antimonide. Special care is taken to address finite-size effects, band gap error, and symmetry reduction in the defect structures. The correction of the band gap is based on a set of GW calculations. The most important defects are identified to be the aluminum interstitial Al-i,Al(1+), the antimony antisites Sb-Al(0) and Sb-Al(1+), and the aluminum vacancy V-Al(3-). The intrinsic defect and charge carrier concentrations in the impurity-free material are calculated by self-consistently solving the charge neutrality equation. The impurity-free material is found to be n-type conducting at finite temperatures.
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页数:11
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