High-performance flexible zinc tin oxide field-effect transistors

被引:238
作者
Jackson, WB
Hoffman, RL
Herman, GS
机构
[1] Hewlett Packard Labs, Palo Alto, CA 94304 USA
[2] Hewlett Packard Corp, Corvallis, OR 97330 USA
关键词
D O I
10.1063/1.2120895
中图分类号
O59 [应用物理学];
学科分类号
摘要
Flexible transistors were fabricated by sputter deposition of zinc tin oxide (ZTO) onto plasma-enhanced chemical vapor deposition gate dielectrics formed on flexible polyimide substrates with a blanket aluminum gate electrode. The flexible transistors exhibited high on-currents of 1 mA, on/off ratios of 10(6), subthreshold voltage slopes of 1.6 V/decade, turn-on voltages of -17 V, and mobilities of 14 cm(2) V-1 s(-1). Capacitance measurements indicate that the threshold voltage and subthreshold slope are primarily influenced by residual doping in the ZTO rather than by defects at the semiconductor/dielectric interface, and are useful for assessing contact resistance. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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