Molecular precursors for the CVD of niobium and tantalum nitride

被引:21
作者
Bleau, JE
Carmalt, CJ
O'Neill, SA
Parkin, IP
White, AJP
Williams, DJ
机构
[1] UCL, Christopher Ingold Labs, Dept Chem, London WC1H 0AJ, England
[2] Univ London Imperial Coll Sci Technol & Med, Dept Chem, London SW7 2AZ, England
关键词
tantalum nitride; niobium nitride; CVD;
D O I
10.1016/j.poly.2004.12.006
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Treatment of NbCl(5) with excess HN(SiMe(2)Ph)2 in toluene resulted in the formation of crystalline [NbCl(3)(NSiMe(2)Ph)(NH(2)SiMe(2)Ph)](2), In the presence of excess 3,5-lutidine (3,5-Me(2)C(5)H(3)N), the reaction of TaCl(5) with 2 equivalents of HN(SiMe(3))(2) resulted in the isolation of the monomeric complex [TaCl(3)(NSiMe(3))(NC(5)H(3)Me(2)-3,5)(2)]. The X-ray crystal structure of [TaCl(3)(NSiMe(3))(NC(5)H(3)Me(2)-3,5)(2)] has been determined. Low pressure chemical vapour deposition of [NbCl(3)(NSiMe(2)Ph)(NH(2)SiMe(2)Ph)](2) and [TaCl(3)(NSiMe(3))(NC(5)H(3)Me(2-)3,5)(2)] forms thin films of niobium and tantalum nitride, respectively, at 600degreesC. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:463 / 468
页数:6
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