Numerical study of the effect of gas temperature on the time for onset of particle nucleation in argon-silane low-pressure plasmas

被引:59
作者
Bhandarkar, U [1 ]
Kortshagen, U [1 ]
Girshick, SL [1 ]
机构
[1] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA
关键词
D O I
10.1088/0022-3727/36/12/307
中图分类号
O59 [应用物理学];
学科分类号
摘要
Particle nucleation in silane plasmas has attracted interest for the past decade, both due to the basic problems of plasma chemistry involved and the importance of silane plasmas for many applications. A better understanding of particle nucleation may facilitate the avoidance of undesirable particle contamination as well as enable the controlled production of nanoparticles for novel applications. While understanding of particle nucleation has significantly advanced over the past years, a number of questions have not been resolved. Among these is the delay of particle nucleation with an increasing Gas temperature, which has been observed in experiments in argon-silane plasmas. We have developed a quasi-one-dimensional model to simulate particle nucleation and growth in silane containing plasmas. In this paper we present a comparative study of the various effects that have been proposed as explanations for the nucleation delay. Our results suggest that the temperature dependence of the Brownian diffusion coefficient is the most important effect, as diffusion affects both the loss rate and growth rate of particles.
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页码:1399 / 1408
页数:10
相关论文
共 51 条
[1]   PARTICULATE GENERATION IN SILANE AMMONIA RF DISCHARGES [J].
ANDERSON, HM ;
JAIRATH, R ;
MOCK, JL .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (09) :3999-4011
[2]   Evidence of storing and erasing of electrons in a nanocrystalline-Si based memory device at 77 K [J].
Banerjee, S ;
Huang, SY ;
Yamanaka, T ;
Oda, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (03) :1135-1138
[3]   Modelling of silicon hydride clustering in a low-pressure silane plasma [J].
Bhandarkar, UV ;
Swihart, MT ;
Girshick, SL ;
Kortshagen, UR .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (21) :2731-2746
[4]   Particulate formation and dusty plasma behaviour in argon-silane RF discharge [J].
Bouchoule, A. ;
Boufendi, L. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (03) :204-213
[5]  
BOUCHOULE A, 2000, DUSTY PLASMAS, P349
[6]   PARTICLE PARTICLE INTERACTIONS IN DUSTY PLASMAS [J].
BOUFENDI, L ;
BOUCHOULE, A ;
PORTEOUS, RK ;
BLONDEAU, JP ;
PLAIN, A ;
LAURE, C .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (05) :2160-2162
[7]   STUDY OF INITIAL DUST FORMATION IN AN AR-SIH4 DISCHARGE BY LASER-INDUCED PARTICLE EXPLOSIVE EVAPORATION [J].
BOUFENDI, L ;
HERMANN, J ;
BOUCHOULE, A ;
DUBREUIL, B ;
STOFFELS, E ;
STOFFELS, WW ;
DEGIORGI, ML .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (01) :148-153
[8]   Detection of particles of less than 5 nm in diameter formed in an argon-silane capacitively coupled radio-frequency discharge [J].
Boufendi, L ;
Gaudin, J ;
Huet, S ;
Viera, G ;
Dudemaine, M .
APPLIED PHYSICS LETTERS, 2001, 79 (26) :4301-4303
[9]   Particle nucleation and growth in a low-pressure argon-silane discharge [J].
Boufendi, L. ;
Bouchoule, A. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :262-267
[10]  
BUSS RJ, 1988, J APPL PHYS, V63, P2802