共 9 条
Growth of textured c-axis normal Y1Ba2Cu3O7-delta thin films on yttria-stabilized zirconia substrates with crystalline axes tilted with respect to the surfaces
被引:18
作者:

Kim, JH
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机构:
KOREA ADV INST SCI & TECHNOL,DEPT PHYS,TAEJON 305107,SOUTH KOREA KOREA ADV INST SCI & TECHNOL,DEPT PHYS,TAEJON 305107,SOUTH KOREA

Youm, D
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机构:
KOREA ADV INST SCI & TECHNOL,DEPT PHYS,TAEJON 305107,SOUTH KOREA KOREA ADV INST SCI & TECHNOL,DEPT PHYS,TAEJON 305107,SOUTH KOREA
机构:
[1] KOREA ADV INST SCI & TECHNOL,DEPT PHYS,TAEJON 305107,SOUTH KOREA
来源:
PHYSICA C
|
1997年
/
275卷
/
3-4期
关键词:
D O I:
10.1016/S0921-4534(96)00711-3
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Well textured c-axis normal Y1Ba2Cu3O7-delta (YBCO) thin films on yttria-stabilized zirconia(YSZ) substrates whose crystalline axes are tilted by 45 degrees, 30 degrees, 20 degrees, 10 degrees, 0 degrees (untilted) with respect to the surfaces have been fabricated using dc-sputtering. CeO2 buffer layers of the same thickness, 15 Angstrom, were deposited on all substrates prior to YBCO deposition. For untilted crystalline YSZ substrate, an oxygen ion milling pretreatment on its surface is necessary. Microscopic effects of the ion milling were investigated by X-ray photoelectron spectroscopy and atomic force microscope. The crystalline qualities of the YBCO films were investigated by X-ray diffraction 2 theta and phi-scan measurements. For all films, the measured zero resistance temperatures (T-c's) and critical current densities (J(c)'s) were 84-85 K and above 10(6) A/cm(2) at 77 K, respectively.
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页码:273 / 278
页数:6
相关论文
共 9 条
[1]
EFFECTS OF SUBSTRATE-TEMPERATURE ON THE MICROSTRUCTURE OF YBA2CU3O7-DELTA FILMS GROWN ON (001) Y-ZRO2 SUBSTRATES
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ALARCO, JA
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BRORSSON, G
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NILSSON, PA
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APPLIED PHYSICS LETTERS,
1992, 61 (06)
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ALARCO, JA
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN

BRORSSON, G
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN

IVANOV, ZG
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN

NILSSON, PA
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN

OLSSON, E
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN

LOFGREN, M
论文数: 0 引用数: 0
h-index: 0
机构:
CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN CHALMERS UNIV TECHNOL,DEPT APPL ELECTRON PHYS,S-41296 GOTHENBURG,SWEDEN
[2]
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COPETTI, CA
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SOLTNER, H
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APPLIED PHYSICS LETTERS,
1993, 63 (10)
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COPETTI, CA
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

SOLTNER, H
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

SCHUBERT, J
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

ZANDER, W
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

HOLLRICHER, O
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

BUCHAL, C
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

SCHULZ, H
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

TELLMANN, N
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY

KLEIN, N
论文数: 0 引用数: 0
h-index: 0
机构:
KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY KFA,FORSCHUNGSZENTRUM JULICH,INST FESTKORPERFORSCH,D-52428 JULICH,GERMANY
[3]
Buffer Layers for High-Quality Epitaxial YBCO Films on Si
[J].
Fork, David K.
;
Fenner, David B.
;
Barrera, Adrian
;
Phillips, Julia M.
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;
Connell, G. A. N.
;
Boyce, James B.
.
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY,
1991, 1 (01)
:67-73

Fork, David K.
论文数: 0 引用数: 0
h-index: 0
机构:
Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Xerox Palo Alto Res Ctr, Palo Alto, CA USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

Fenner, David B.
论文数: 0 引用数: 0
h-index: 0
机构:
Xerox Palo Alto Res Ctr, Palo Alto, CA USA
Santa Clara Univ, Dept Phys, Santa Clara, CA 95053 USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

Barrera, Adrian
论文数: 0 引用数: 0
h-index: 0
机构:
Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

Phillips, Julia M.
论文数: 0 引用数: 0
h-index: 0
机构:
AT&T Bell Labs, Murray Hill, NJ 07974 USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

Geballe, Theodore H.
论文数: 0 引用数: 0
h-index: 0
机构:
Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

Connell, G. A. N.
论文数: 0 引用数: 0
h-index: 0
机构:
Xerox Palo Alto Res Ctr, Palo Alto, CA USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

Boyce, James B.
论文数: 0 引用数: 0
h-index: 0
机构:
Xerox Palo Alto Res Ctr, Palo Alto, CA USA Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
[4]
EFFECTS OF HOMOEPITAXIAL SURFACES AND INTERFACE COMPOUNDS ON THE INPLANE EPITAXY OF YBCO FILMS ON YTTRIA-STABILIZED ZIRCONIA
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FORK, DK
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GEBALLE, TH
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JOURNAL OF MATERIALS RESEARCH,
1992, 7 (07)
:1641-1651

FORK, DK
论文数: 0 引用数: 0
h-index: 0
机构: XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

GARRISON, SM
论文数: 0 引用数: 0
h-index: 0
机构: XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

HAWLEY, M
论文数: 0 引用数: 0
h-index: 0
机构: XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

GEBALLE, TH
论文数: 0 引用数: 0
h-index: 0
机构: XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
[5]
OBSERVATION OF 2 INPLANE EPITAXIAL STATES IN YBA2CU3O7-DELTA FILMS ON YTTRIA-STABILIZED ZRO2
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BARTON, RW
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1991, 58 (19)
:2168-2170

GARRISON, SM
论文数: 0 引用数: 0
h-index: 0
机构: Conductus, Inc., Sunnyvale, CA 94086

NEWMAN, N
论文数: 0 引用数: 0
h-index: 0
机构: Conductus, Inc., Sunnyvale, CA 94086

COLE, BF
论文数: 0 引用数: 0
h-index: 0
机构: Conductus, Inc., Sunnyvale, CA 94086

CHAR, K
论文数: 0 引用数: 0
h-index: 0
机构: Conductus, Inc., Sunnyvale, CA 94086

BARTON, RW
论文数: 0 引用数: 0
h-index: 0
机构: Conductus, Inc., Sunnyvale, CA 94086
[6]
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1994, 64 (12)
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HAAKENAASEN, R
论文数: 0 引用数: 0
h-index: 0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304 XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

FORK, DK
论文数: 0 引用数: 0
h-index: 0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304 XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

GOLOVCHENKO, JA
论文数: 0 引用数: 0
h-index: 0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304 XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
[7]
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APPLIED PHYSICS LETTERS,
1991, 58 (21)
:2429-2431

HWANG, DM
论文数: 0 引用数: 0
h-index: 0
机构:
SUNY BUFFALO,INST SUPERCOND,BUFFALO,NY 14260 SUNY BUFFALO,INST SUPERCOND,BUFFALO,NY 14260

YING, QY
论文数: 0 引用数: 0
h-index: 0
机构:
SUNY BUFFALO,INST SUPERCOND,BUFFALO,NY 14260 SUNY BUFFALO,INST SUPERCOND,BUFFALO,NY 14260

KWOK, HS
论文数: 0 引用数: 0
h-index: 0
机构:
SUNY BUFFALO,INST SUPERCOND,BUFFALO,NY 14260 SUNY BUFFALO,INST SUPERCOND,BUFFALO,NY 14260
[8]
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1994, 75 (01)
:412-422

MACMANUSDRISCOLL, J
论文数: 0 引用数: 0
h-index: 0
机构: Department of Materials Science and Engineering, Stanford University, Stanford

GEBALLE, TH
论文数: 0 引用数: 0
h-index: 0
机构: Department of Materials Science and Engineering, Stanford University, Stanford

BRAVMAN, JC
论文数: 0 引用数: 0
h-index: 0
机构: Department of Materials Science and Engineering, Stanford University, Stanford
[9]
EPITAXIAL CEO2 FILMS AS BUFFER LAYERS FOR HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS
[J].
WU, XD
;
DYE, RC
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FOLTYN, SR
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ROLLETT, AD
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GARCIA, AR
;
NOGAR, NS
.
APPLIED PHYSICS LETTERS,
1991, 58 (19)
:2165-2167

WU, XD
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

DYE, RC
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

MUENCHAUSEN, RE
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

FOLTYN, SR
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

MALEY, M
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

ROLLETT, AD
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

GARCIA, AR
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos

NOGAR, NS
论文数: 0 引用数: 0
h-index: 0
机构: Exploratory Research and Development Center, Los Alamos National Laboratory, Los Alamos