Advanced large-area microwave plasmas for materials processing

被引：22

作者：

Ganachev, I

Sugai, H

机构：

[1] Shibaura Mechatron Corp, Sakae Ku, Yokohama, Kanagawa 2478560, Japan

[2] Nagoya Univ, Dept Elect Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 174卷

关键词：

microwave plasma; surface-wave plasma; corrugated interface;

D O I：

10.1016/S0257-8972(03)00374-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This is a review of the planar non-magnetized microwave plasma sources applied for surface processing. It introduces the basic features of these plasma sources and outlines the main phenomena necessary to understand their operation. The accent is on showing the areas where the application of such plasma sources is advantageous. Recent developments, in particular the corrugated-surface microwave plasma source, are presented. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

收藏

页码：15 / 20

页数：6

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