Influence of gas pressure and magnetic field upon de magnetron discharge

被引：33

作者：

Shidoji, E

Ness, K

Makabe, T

机构：

[1] Asahi Glass Co Ltd, Res Ctr, Kanagawa Ku, Yokohama, Kanagawa 2218755, Japan

[2] James Cook Univ N Queensland, Sch Comp Sci Math & Phys, Townsville, Qld 4811, Australia

[3] Keio Univ, Dept Elect Engn, Yokohama, Kanagawa 2238522, Japan

来源：

VACUUM | 2001年 / 60卷 / 03期

关键词：

magnetron; plasma; simulation; sputtering process;

D O I：

10.1016/S0042-207X(00)00408-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have proposed a hybrid model for de magnetron discharge. Simulations of the discharges under different applied voltages are performed using the hybrid model. We confirm that this hybrid model is able to predict a magnetron discharge under conditions of less than 1 Pa by comparing the results from the simulation with that from the experiment. We also perform simulations of de magnetron discharges under conditions of different gas pressures and different magnitudes of magnetic field. In so doing, we clarify the influence of gas pressure and magnetic field upon de magnetron discharge. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：299 / 306

页数：8

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