Silicon planar parabolic lenses

被引：18

作者：

Aristov, V ^{[1
]}

Grigoriev, M ^{[1
]}

Kuznetsov, S ^{[1
]}

Shabelnikov, L ^{[1
]}

Yunkin, V ^{[1
]}

Rau, C ^{[1
]}

Snigirev, A ^{[1
]}

Snigireva, I ^{[1
]}

Weitkamp, T ^{[1
]}

Hoffmann, M ^{[1
]}

Voges, E ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Microelect Technol, Chernogolovka 142432, Russia

来源：

ADVANCES IN X-RAY OPTICS | 2001年 / 4145卷

关键词：

X-rays; silicon; refraction; lenses; parabolic; transmission; gain; heatload; microfabrication; focusing;

D O I：

10.1117/12.411648

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Silicon planar parabolic refractive lenses with relief depth of 100 mum are realized by microfabrication technique. A set of 5 planar lenses with simple parabolic profiles and equal apertures and equal focal distances is realized. This set consists of different number (from 1 to 8) of individual lenses. Lenses with minimized absorption as a set of parabolic segments are fabricated too. Focusing and spectral properties of silicon planar parabolic lenses were studied with synchrotron radiation in the x-ray energy range 8-25 keV at the ESRF. Linear focus spots of 1.5 mum width were recorded for the parabolic lenses and 1.8 mum for the lenses with minimized absorption. The intensity transmission of the lens with minimized absorption is two times greater than this value of simple parabolic lenses at 8 keV and in the x-ray energy range over 15 keV overcomes 90%. Spectral propeties of the lenses with minized absorption are discussed in details. Heatload properties of the silicon planar lenses are analysed and compared with the lenses made of diamond.

引用

页码：285 / 293

页数：9

共 16 条

[1] Short-focus silicon parabolic lenses for hard X-rays [J].

Aristov, VV ;

Starkov, VV ;

Shabel'nikov, LG ;

Kuznetsov, SM ;

Ushakova, AP ;

Grigoriev, MV ;

Tseitlin, VM .

OPTICS COMMUNICATIONS, 1999, 161 (4-6) :203-208

[2] X-ray focusing by planar parabolic refractive lenses made of silicon [J].

Aristov, VV ;

Grigoriev, MV ;

Kuznetsov, SM ;

Shabelnikov, LG ;

Yunkin, VA ;

Hoffmann, M ;

Voges, E .

OPTICS COMMUNICATIONS, 2000, 177 (1-6) :33-38

[3]

ARISTOV VV, 1999, SURFACE INVESTIGATIO, V14, P3

[4] Instrumental aspects of x-ray microbeams in the range above 1 keV [J].

Dhez, P ;

Chevallier, P ;

Lucatorto, TB ;

Tarrio, C .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (04) :1907-1920

[5] EVALUATION, VERIFICATION AND ERROR DETERMINATION OF PROXIMITY PARAMETERS ALPHA,BETA AND ETA IN ELECTRON-BEAM LITHOGRAPHY [J].

DUBONOS, SV ;

GAIFULLIN, BN ;

RAITH, HF ;

SVINTSOV, AA ;

ZAITSEV, SI .

MICROELECTRONIC ENGINEERING, 1993, 21 (1-4) :293-296

[6] SPECTRAL PROPERTIES OF MULTIORDER DIFFRACTIVE LENSES [J].

FAKLIS, D ;

MORRIS, GM .

APPLIED OPTICS, 1995, 34 (14) :2462-2468

[7]

Goodman W., 2005, INTRO FOURIER OPTICS, V3rd

[8] Recent advances in silicon etching for MEMS using the ASE™ process [J].

Hynes, AM ;

Ashraf, H ;

Bhardwaj, JK ;

Hopkins, J ;

Johnston, I ;

Shepherd, JN .

SENSORS AND ACTUATORS A-PHYSICAL, 1999, 74 (1-3) :13-17

[9] Imaging by parabolic refractive lenses in the hard X-ray range [J].

Lengeler, B ;

Schroer, C ;

Tümmler, J ;

Benner, B ;

Richwin, M ;

Snigirev, A ;

Snigireva, I ;

Drakopoulos, M .

JOURNAL OF SYNCHROTRON RADIATION, 1999, 6 :1153-1167

[10] A microscope for hard x rays based on parabolic compound refractive lenses [J].

Lengeler, B ;

Schroer, CG ;

Richwin, M ;

Tümmler, J ;

Drakopoulos, M ;

Snigirev, A ;

Snigireva, I .

APPLIED PHYSICS LETTERS, 1999, 74 (26) :3924-3926

← 1 2 →