The application of minority carrier lifetime techniques in modern CZ silicon

被引:14
作者
Falster, R [1 ]
Borionetti, G [1 ]
机构
[1] MEMC Elect Mat SPA, I-28100 Novara, Italy
来源
RECOMBINATION LIFETIME MEASUREMENTS IN SILICON | 1998年 / 1340卷
关键词
minority carrier recombination lifetime; Czochralski silicon; transition metals; oxygen precipitation; point defects;
D O I
10.1520/STP15708S
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The applications of minority carrier recombination lifetime measurement techniques to a variety of problems associated with the manufacture and use of modem CZ silicon are discussed. The uses of the ELYMAT and microwave photoconductive decay techniques applied to issues of transition metal contamination, ultra long carrier lifetimes, oxygen clustering and precipitation, intrinsic point defect reactions and gettering phenomena are considered. The uses and limitations of injection level control and surface recombination velocity measurement are also discussed.
引用
收藏
页码:226 / 249
页数:24
相关论文
共 23 条
[1]   Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: The detection of copper and nickel contamination by minority carrier lifetime methods [J].
Bazzali, A ;
Borionetti, G ;
Orizio, R ;
Gambaro, D ;
Falster, R .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 36 (1-3) :85-90
[2]   IRON AND THE IRON-BORON COMPLEX IN SILICON [J].
BROTHERTON, SD ;
BRADLEY, P ;
GILL, A .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) :1941-1943
[3]  
CAVALOLI D, 1994, PHILOS MAG B, V94, P1095
[4]   AUGER COEFFICIENTS FOR HIGHLY DOPED AND HIGHLY EXCITED SILICON [J].
DZIEWIOR, J ;
SCHMID, W .
APPLIED PHYSICS LETTERS, 1977, 31 (05) :346-348
[5]  
Faister R., 1993, P SAT S ESSDERC 93 G, V93-15, P149
[6]   THE GETTERING OF TRANSITION-METALS BY OXYGEN-RELATED DEFECTS IN SILICON [J].
FALSTER, R ;
BERGHOLZ, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (05) :1548-1559
[7]  
FALSTER R, IN PRESS
[8]   A PHYSICAL MODEL FOR THE DEPENDENCE OF CARRIER LIFETIME ON DOPING DENSITY IN NONDEGENERATE SILICON [J].
FOSSUM, JG ;
LEE, DS .
SOLID-STATE ELECTRONICS, 1982, 25 (08) :741-747
[9]  
GILLES D, 1990, PHYS REV LETT, V64, P1961
[10]  
GRAFF K, 1983, ELECTROCHEMICAL SOC, P121