Metalorganic chemical vapor deposition of monocrystalline GaN thin films on beta-LiGaO2 substrates

被引:67
作者
Kung, P [1 ]
Saxler, A [1 ]
Zhang, X [1 ]
Walker, D [1 ]
Lavado, R [1 ]
Razeghi, M [1 ]
机构
[1] USAF,WRIGHT LAB,MATERIALS DIRECTORATE,WRIGHT PATTERSON AFB,OH 45433
关键词
D O I
10.1063/1.116898
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the metalorganic chemical vapor deposition growth and characterization of monocrystalline GaN thin films on beta-LiGaO2 substrates. The influence of the growth temperature on the crystal quality was studied. The structural, electrical, and optical properties of the films were assessed through scanning electron microscopy, x-ray diffraction, Hall measurements, optical transmission, photoluminescence. (C) 1996 American Institute of Physics.
引用
收藏
页码:2116 / 2118
页数:3
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