Electrical impact of SiC structural crystal defects on high electric field devices

被引:105
作者
Neudeck, PG [1 ]
机构
[1] NASA, Glenn Res Ctr, Cleveland, OH 44135 USA
来源
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2 | 2000年 / 338-3卷
关键词
avalanche breakdown; crystal defect; diode; epilayer growth pits; micropipe; microplasmas; pn junction; rectifiers; reliability; safe operating area; Schottky diodes; screw dislocation;
D O I
10.4028/www.scientific.net/MSF.338-342.1161
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Commercial epilayers are known to contain a variety of crystallographic imperfections, including micropipes, closed core screw dislocations, low-angle boundaries, basal plane dislocations, heteropolytypic inclusions, and non-ideal surface features like step bunching and pits. This paper reviews the limited present understanding of the operational impact of various crystal defects on SiC electrical devices. Aside from micropipes and triangular inclusions whose densities have been shrinking towards manageably small values in recent years, many of these defects appear to have little adverse operational and/or yield impact on SiC-based sensors, high-frequency RF, and signal conditioning electronics. However high-power switching devices used in power management and distribution circuits have historically (in silicon experience) demanded the highest material quality for prolonged safe operation, and are thus more susceptible to operational reliability problems that arise from electrical property nonuniformities likely to occur at extended crystal defects. A particular emphasis is placed on the impact of closed-core screw dislocations on high-power switching devices, because these difficult to observe defects are present in densities of thousands per cm(2) in commercial SiC epilayers, and their reduction to acceptable levels seems the most problematic at the present time.
引用
收藏
页码:1161 / 1166
页数:6
相关论文
共 23 条
[1]   Effect of surface inhomogeneities on the electrical characteristics of SiC Schottky contacts [J].
Bhatnagar, M ;
Baliga, BJ ;
Kirk, HR ;
Rozgonyi, GA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (01) :150-156
[2]  
*CREE RES INC, 1999, SIC DAT SHEETS
[3]   Barrier inhomogeneities and electrical characteristics of Ti/4H-SiC Schottky rectifiers [J].
Defives, D ;
Noblanc, O ;
Dua, C ;
Brylinski, C ;
Barthula, M ;
Aubry-Fortuna, V ;
Meyer, F .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (03) :449-455
[4]  
ELASSER A, 1999, IN PRESS SOLID STATE
[5]  
Fazi C., 1994, I PHYS C SER, V137, P487
[6]  
Khlebnikov I, 1998, MATER RES SOC SYMP P, V483, P123
[7]   Performance limiting surface defects in SiC epitaxial p-n junction diodes [J].
Kimoto, T ;
Miyamoto, N ;
Matsunami, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (03) :471-477
[8]   Study of avalanche breakdown and impact ionization in 4H silicon carbide [J].
Konstantinov, AO ;
Wahab, Q ;
Nordell, N ;
Lindefelt, U .
JOURNAL OF ELECTRONIC MATERIALS, 1998, 27 (04) :335-341
[9]  
Neudeck PG, 1998, MATER RES SOC SYMP P, V483, P285
[10]   Study of bulk and elementary screw dislocation assisted reverse breakdown in low-voltage (<250 V) 4H-SiC p+n junction diodes -: Part I:: DC properties [J].
Neudeck, PG ;
Huang, W ;
Dudley, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (03) :478-484