Microbeam studies of single-event effects

被引:48
作者
Sexton, FW
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1109/23.490912
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The application of heavy-ion microbeam systems to the study of single-event effects is reviewed. Apertured microbeam systems have been used since the early 1980's to study charge collection. This has led to the development of the present models for the transport of charge following heavy-ion strikes in semiconductors. More recently, magnetically focused scanned microbeams have allowed direct imaging of charge collection regions with a technique called IBICC (ion-beam induced charge collection). Charge collection depth can be extracted from the pulse height spectrum from well-defined regions of the IC. When applied to single event upset, those regions sensitive to upset have been directly mapped with scanned microbeam systems. Damage effects due to total-ionizing dose and displacement damage are discussed. These techniques have removed uncertainty associated with broad-beam techniques, and improved our understanding of the mechanisms responsible for single-event effects in IC's.
引用
收藏
页码:687 / 695
页数:9
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