Precise and simple optical alignment method for double-sided lithography

被引：15

作者：

Gruber, M ^{[1
]}

Hagedorn, D ^{[1
]}

Eckert, W ^{[1
]}

机构：

[1] Univ Hagen, D-58084 Hagen, Germany

来源：

APPLIED OPTICS | 2001年 / 40卷 / 28期

关键词：

D O I：

10.1364/AO.40.005052

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A method for aligning a photolithographic mask at the top of a transparent wafer that has a pattern on its bottom side is presented. The method is based on optical self-imaging of special alignment marks and provides submicrometer accuracy. The method is simple and robust and can conveniently be implemented on laboratory mask aligners for contact or proximity printing. (C) 2001 Optical Society of America.

引用

页码：5052 / 5055

页数：4

共 9 条

[1] On-die diffractive alignment structures for packaging of microlens arrays with 2-D optoelectronic device arrays [J].