Si and SiOx nanostructures formed via thermal evaporation

被引：56

作者：

Chen, YJ ^{[1
]}

Li, JB ^{[1
]}

Dai, JH ^{[1
]}

机构：

[1] Tsing Hua Univ, Dept Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

来源：

CHEMICAL PHYSICS LETTERS | 2001年 / 344卷 / 5-6期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1016/S0009-2614(01)00742-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Various Si and SiOx (x = I to 2) nanostructures were formed via a thermal evaporation method of heating pure silicon powder at 1373 K under Ar flow. An alkali-treated quartz glass plate coating with catalyst precursor of a Fe(NO3)(3) aqueous solution was used as substrate. The product exhibited morphologies of fist-capped SiOx fibers (Si-core), tree-like SiOx nanofibers and tadpole-like SiOx nanofibers in different areas of the substrate. The different local temperature gradient, concentration of silicon vapor and silicon oxide vapor, and also the substrate surface condition were suggested to be responsible for the versatile morphologies of the products. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：450 / 456

页数：7

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