Patterned dielectric mirrors for lateral overgrowth of GaN-based lasers.

被引:9
作者
Kim, T
Martin, RW [1 ]
Watson, IM
Dawson, MD
Krauss, TF
Marsh, JH
De la Rue, RM
机构
[1] Univ Strathclyde, Dept Phys, Glasgow G4 0NG, Lanark, Scotland
[2] Univ Strathclyde, Inst Photon, Glasgow G4 0NW, Lanark, Scotland
[3] Univ Glasgow, Dept Elect & Elect Engn, Glasgow G12 8LT, Lanark, Scotland
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2001年 / 82卷 / 1-3期
基金
英国工程与自然科学研究理事会;
关键词
nitride semiconductors; VCSELs; microcavities; oxide mirrors;
D O I
10.1016/S0921-5107(00)00782-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The performance of GaN-based surface-emitting lasers may be greatly improved by the use of highly-reflecting SiO2/ZrO2 multilayers for both cavity mirrors. We consider some of the limitations of GaN/Al(Ga)N multilayer mirrors and discuss alternative routes for incorporating dielectric multilayers within InGaN/GaN quantum well surface-emitting devices, using lateral epitaxial overgrowth. The use of lateral overgrowth techniques promise the benefit of reduced dislocation densities within the active region. The use of single layer lift-off techniques for the fabrication of patterned mirror templates suitable for overgrowth on GaN-on-sapphire is described. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:245 / 247
页数:3
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