Femto- and nanosecond laser treatment of doped polymethylmethacrylate

被引：46

作者：

Krüger, J

Martin, S

Mädebach, H

Urech, L

Lippert, T

Wokaun, A

Kautek, W

机构：

[1] Fed Inst Mat Res & Testing, Lab Thin Film Technol, D-12205 Berlin, Germany

[2] Paul Scherrer Inst, Dept Gen Energy, CH-5232 Villigen, Switzerland

[3] Univ Vienna, Inst Phys Chem, A-1090 Vienna, Austria

来源：

APPLIED SURFACE SCIENCE | 2005年 / 247卷 / 1-4期

关键词：

laser ablation; laser beam machining; doping thin films; polymers-radiation effects;

D O I：

10.1016/j.apsusc.2005.01.078

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Femto- and nanosecond laser ablation of polymethylmethacrylate (PMMA) and PMMA doped with a linear absorber was investigated in the infrared spectral region. Ablation thresholds were determined and incubation phenomena were identified. The 'degree' of incubation was calculated employing a phenomenological model. The influence of the pulse duration on the machining quality of the polymers was examined. The presence of an absorbing chromophore is not a prerequisite for a controllable fs-laser structuring in contrast to the ns-treatment. Surface swelling always accompanied ablation. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：406 / 411

页数：6

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