Femto- and nanosecond laser treatment of doped polymethylmethacrylate

被引：46

作者：

Krüger, J

Martin, S

Mädebach, H

Urech, L

Lippert, T

Wokaun, A

Kautek, W

机构：

[1] Fed Inst Mat Res & Testing, Lab Thin Film Technol, D-12205 Berlin, Germany

[2] Paul Scherrer Inst, Dept Gen Energy, CH-5232 Villigen, Switzerland

[3] Univ Vienna, Inst Phys Chem, A-1090 Vienna, Austria

来源：

APPLIED SURFACE SCIENCE | 2005年 / 247卷 / 1-4期

关键词：

laser ablation; laser beam machining; doping thin films; polymers-radiation effects;

D O I：

10.1016/j.apsusc.2005.01.078

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Femto- and nanosecond laser ablation of polymethylmethacrylate (PMMA) and PMMA doped with a linear absorber was investigated in the infrared spectral region. Ablation thresholds were determined and incubation phenomena were identified. The 'degree' of incubation was calculated employing a phenomenological model. The influence of the pulse duration on the machining quality of the polymers was examined. The presence of an absorbing chromophore is not a prerequisite for a controllable fs-laser structuring in contrast to the ns-treatment. Surface swelling always accompanied ablation. (c) 2005 Elsevier B.V. All rights reserved.

引用

收藏

页码：406 / 411

页数：6

相关论文

共 27 条

[11] Femtosecond-pulse visible laser processing of transparent materials [J].

Kruger, J ;

Kautek, W .

APPLIED SURFACE SCIENCE, 1996, 96-8 :430-438

[12] ABLATION OF POLYMER-FILMS BY A FEMTOSECOND HIGH-PEAK-POWER TI SAPPHIRE LASER AT 798-NM [J].

KUMAGAI, H ;

MIDORIKAWA, K ;

TOYODA, K ;

NAKAMURA, S ;

OKAMOTO, T ;

OBARA, M .

APPLIED PHYSICS LETTERS, 1994, 65 (14) :1850-1852

[13] Photoablation and microstructuring of polyestercarbonates and their blends with a XeCl excimer laser [J].

Kunz, T ;

Stebani, J ;

Ihlemann, J ;

Wokaun, A .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 67 (03) :347-352

[14] FEMTOSECOND UV EXCIMER LASER ABLATION [J].

KUPER, S ;

STUKE, M .

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1987, 44 (04) :199-204

[15] Precision laser ablation of dielectrics in the 10-fs regime [J].

Lenzner, M ;

Krüger, J ;

Kautek, W ;

Krausz, F .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 68 (03) :369-371

[16] Laser application of polymers [J].

Lippert, T .

POLYMERS AND LIGHT, 2004, 168 :51-246

[17] Photopolymers designed for laser ablation - photochemical ablation mechanism [J].

Lippert, T ;

Dickinson, JT ;

Langford, SC ;

Furutani, H ;

Fukumura, H ;

Masuhara, H ;

Kunz, T ;

Wokaun, A .

APPLIED SURFACE SCIENCE, 1998, 127 :117-121

[18] SIMPLE TECHNIQUE FOR MEASUREMENTS OF PULSED GAUSSIAN-BEAM SPOT SIZES [J].

LIU, JM .

OPTICS LETTERS, 1982, 7 (05) :196-198

[19] Effect of pulse duration on ablation characteristics of tetrafluoroethylene hexafluoropropylene copolymer film using Ti:sapphire laser [J].

Nakamura, S ;

Midorikawa, K ;

Kumagai, H ;

Obara, M ;

Toyoda, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (1A) :101-106

[20]

Niino H., 2001, Journal of Photopolymer Science and Technology, V14, P197, DOI 10.2494/photopolymer.14.197