Growth of CuInS2 and CuIn5S8 on Si(001) by the multisource evaporation method

被引:12
作者
Kobayashi, S
Tsuboi, N
Sega, T
Oishi, K
Kaneko, F
机构
[1] Niigata Univ, Fac Engn, Niigata 9502181, Japan
[2] Niigata Univ, Grad Sch Sci & Technol, Niigata 9502181, Japan
[3] Nagaoka Natl Coll Technol, Nagaoka, Niigata 9408532, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2003年 / 42卷 / 9A期
关键词
reflection high energy electron diffraction; X-ray diffraction; vapor phase epitaxy; CuInS2; CuIn5S8; semiconducting ternary compounds; Cu-Au structure;
D O I
10.1143/JJAP.42.5485
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films of CuInS2, CuIn5S8 and a mixture of these were epitaxially grown on Si(001) wafers at 400 degreesC using a multisource evaporation method in which the In source temperature was varied. X-ray diffraction and reflection high energy electron diffraction observation showed that the CuInS2 film did not crystallize in the chalcopyrite structure, but in the Cu-Au structure with the c-axis normal to the substrate coexisting with the sphalerite structure. The CuIn5S8 film crystallized in the relaxed spinel structure with fairly good orientation. No evidence of CuIn3S5 was found from the X-ray diffraction patterns.
引用
收藏
页码:5485 / 5489
页数:5
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