Carrier recombination activities and structural properties of small-angle boundaries in multicrystalline silicon

被引:6
作者
Chen, J. [1 ]
Sekiguchi, T. [1 ]
Ito, S. [2 ]
Yang, D. [3 ]
机构
[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai 9808577, Japan
[3] Zhenjiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
来源
GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XII | 2008年 / 131-133卷
关键词
small-angle grain boundaries; mc-Si; EBIC;
D O I
10.4028/www.scientific.net/SSP.131-133.9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The carrier recombination activities of small angle (SA) grain boundaries (GBs) in multicrystalline Si (mc-Si) were systematically investigated by electron-beam-induced current (EBIC). At 300 K, general SA-GBs with tilt angle from 0 degrees to 10 degrees showed weak EBIC contrast (0-10%) with the maximum appeared at 2 degrees. At low temperature (100 K), all the SA-GBs showed strong EBIC contrast despite the tilt angle. Possible explanations for the variation of the EBIC contrast were discussed in terms of boundary dislocations.
引用
收藏
页码:9 / +
页数:2
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