Resonant tunneling in partially disordered silicon nanostructures

被引:36
作者
Tsybeskov, L
Grom, GF
Krishnan, R
Montes, L
Fauchet, PM
Kovalev, D
Diener, J
Timoshenko, V
Koch, F
McCaffrey, JP
Baribeau, JM
Sproule, GI
Lockwood, DJ
Niquet, YM
Delerue, C
Allan, G
机构
[1] Univ Rochester, Dept Elect & Comp Engn, Nanoscale Silicon Res Initiat, Rochester, NY 14627 USA
[2] Tech Univ Munich, Phys Dept E16, D-85747 Garching, Germany
[3] CNR, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
[4] Inst Super Elect Nord, Inst Electron & Microelectron Nord, F-59046 Lille, France
来源
EUROPHYSICS LETTERS | 2001年 / 55卷 / 04期
关键词
D O I
10.1209/epl/i2001-00451-1
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Low-temperature vertical carrier transport in layered structures comprised of Si nanocrystals separated in the growth direction by angstrom-thick SiO2 layers exhibits entirely unexpected, well-defined resonances in conductivity. An unusual alternating current ( ac) conductivity dependence on frequency and low magnetic field, negative differential conductivity, reproducible N-shaped switching and self-oscillations were observed consistently. The modeled conductivity mechanism is associated with resonant hole tunneling via quantized valence band states of Si nanocrystals. Tight-binding calculations of the quantum confinement effect for different Si nanocrystal sizes and shapes strongly support the tunneling model.
引用
收藏
页码:552 / 558
页数:7
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