Plating technology for electronics packaging

被引:51
作者
Honma, H [1 ]
机构
[1] Kanto Gakuin Univ, Fac Engn, Kanazawa Ku, Yokohama, Kanagawa 2360032, Japan
关键词
plating technology; micro-bump; via-holes; adhesion strength; anisotropic conductive particles;
D O I
10.1016/S0013-4686(01)00591-6
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
With the miniaturization of electronic devices, the connection reliability between integrated circuits (IC) and the external circuits has become important. Electroplating and electroless plating have been applied for the metallization of electronic components, Recently, advanced plating technology is strongly in demanded for the manufacturing of electronic components, because many devices are becoming finer and more complicated. In this paper, we focus mainly on the plating technologies for the preparation of micro-electronic components. The bump formation by electro and electroless plating, via-filling by copper electroplating, improvement of adhesion strength between the insulation laver and the deposited metal, and the preparation of anisotropic conductive particles have been investigated. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:75 / 84
页数:10
相关论文
共 24 条
[1]   The electroless copper plating of small via holes [J].
Abe, S ;
Ohkubo, M ;
Fujinami, T ;
Honma, H .
TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 1998, 76 :12-15
[2]   THE EFFECT OF ARSENIC UPON THE HARDNESS OF ELECTRODEPOSITED GOLD [J].
DINAN, TE ;
CHEH, HY .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (02) :410-412
[3]  
FUJINAMI T, 1997, J SURF FINISH SOC, V48, P660
[4]  
FUJINAMI T, 1998, J JPN I ELECT PACK, V1, P66
[5]  
Fujinami T., 1992, JIPC, V43, P595
[6]  
GEMMLER A, 1994, PLAT SURF FINISH, V81, P52
[7]  
Hagiwara K, 1997, PLAT SURF FINISH, V84, P74
[8]   FABRICATION OF GOLD BUMPS USING GOLD SULFITE PLATING [J].
HONMA, H ;
HAGIWARA, K .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (01) :81-87
[9]   DIRECT NICKEL-PLATING ON ALUMINUM SUBSTRATE FOR MICROBUMP FORMATION [J].
HONMA, H ;
WATANABE, H ;
KOBAYASHI, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (07) :1791-1795
[10]   GOLD PLATING USING THE DISULFITEAURATE COMPLEX [J].
HONMA, H ;
KAGAYA, Y .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (09) :L135-L137